Within the semiconductor industry, photographically transferring a pattern from a mask to a wafer is the process of lithography. Within this process many steps are required and specialized processes exist.
With the continuing drive to smaller line widths, purity levels required are constantly increasing. To meet the International Technology Roadmap for Semiconductors (ITRS), new technologies are being developed, again increasing the need for contamination control.
Entegris enables customers to control the dispense volumes and purify process fluids and the environment in order to achieve their roadmap. Entegris enables
- process stability through accuracy and repeatability
- yield improvement through resist dispense, environmental quality and liquid immersion quality
- lightened process parameters such as finer contamination retention
- measurable, accurate and reproducible dispense conditions
- prevention of haze growth on scanner lenses
- isolation of reticle during transportation between mask house to fab or inside the fab
Through improved and new technologies, Entegris participates in its customers' success. New products such as the LiquidLensTM UPW system ensures ultrapure, temperature controlled water for immersion lithography. The Intelligen® Mini dispense system delivers ultimate defect reduction through advanced two-stage technology. ImpactTM Mini filter when used with the Intelligen® Mini dispense system provides the most advanced and cost efficient dispense system/filter combination in the industry.