The reticle used in the lithography process as a pattern for the die is susceptible to damage from many sources. Electrostatic discharge, breakage from mishandling, and both particle and molecular contamination, can all be harmful. Protecting the delicate surface features and preventing contamination maximizes reticle performance.
The Entegris wafer and reticle handling product line is the most comprehensive on the market. The Entegris offering includes mask packages for single reticle storage and shipping, multiple plate shippers and reticle SMIF pods in both 150 mm and 200 mm interface sizes. These reticle handling solutions range from the traditional to those used in the most modern, automated fabs.