In the semiconductor industry, the continuing drive to smaller line widths drives purity requirements for wet etch and clean. Critical particle size continues to shrink as evidenced by the 2007 International Technology Roadmap for Semiconductors (ITRS) defining killer critical particle size as 32 nanometers when the dynamic random access memory (DRAM) half-pitch is 65 nm. Maximizing the purity of chemicals maintains and improves chip yield.
Liquid Filtration
In wet etch and clean processes, Entegris' filtration solutions respond to all challenges from advanced Front-end-of-the-line (FEOL) cleans, to dry ash clean and solvent-based clean in back-end-of the line (BEOL). Entegris' filtration solutions utilize superior membrane technologies for maximum retention efficiency, high flow rate, greatest particle removal, and longest filter life. QuickChange® filters with nondewetting membrane technology are ideal for aqueous based chemical process. Fluorogard® filters with PTFE membrane for hard particle retention are designed for photo-resist stripping and residue removal. Intercept® filters optimized high flow UPE membrane to yield dual particle technologies for maximum particle removal. They are ideally suited for batch bath, single wafer tool, and chemical delivery system for diluted HF and BOE. Guardian® filters with patented hydrophilic UPE membrane provide the best retention efficiency and the lowest particle counts in chemical delivery systems for HF, BOE, NH4F, and copper plating solution.
Fluid Handling
Fluid handling components provide higher capacity and smaller footprints to give OEMs lower tool construction costs and greater build flexibility. The pHasor® II Membrane Contactor removes and/or adds dissolved gases to process fluids while ensuring process stability by controlling dissolved gas content. Reliable, industry-standard Integra® valves offer varying flow rates depending on application with small footprints. The NT® integrated flow controller provides liquid flow control in the smallest footprint available, minimizes space require and offers diagnostics for fast troubleshooting and minimized downtime.
Gas Filtration
Entegris' gas filtration products ensure process gases are contamination free and purified to meet new process requirements for tighter filtration. These products offer higher operating capacity to lower cost of ownership. Includes point-of-use filtration, Bulk filtration and Diffusers.
Wafer Handling
Throughout the process, wafers are removed and returned to Entegris' products to protect and transport valuable wafers. Entegris is the industry leader and supplier of choice for predictable, reliable and innovative wafer handling solutions. The Spectra™ Front Opening Unified Pod (FOUP) offers superior protection of 300 mm wafers.