TWTC Nangang Exhibition Hall
Visit the SEMICON TAIWAN 2012 website for more information.
Wednesday, September 5, 10:00 am - 5:00 pm
Thursday, September 6, 10:00 am - 5:00 pm
Friday, September 7, 10:00 am - 4:00 pm
Visit us at Booth 174, Upper Level 4F Area N
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Click here to download the SEMICON TAIWAN 2012 Exhibitor booth floor plan.
Click here for the location map and directions to TWTC Nangang Exhibition Hall.
450 mm Wafer Handling Products
Designed with collaboration from customers, OEMs and consortiums, our 450 mm wafer handling products are engineered to protect 450 mm wafers from shipment through processing.
On 7 September 2012, Dr. Poshin Lee will speak about Major Considerations in 450 mm Wafer Reticle Handling at the Innovative Technology Centre at 11.30 am – 12.00 pm at level 4 same hall aisle N behind LED Taiwan Pavilion N1300 area Booth 056. Do join us if you are interested to know more about 450 mm advance solutions. For the latest agenda of Innovative Technology Center, click here.
EUV Reticle Pod
Entegris’ extreme ultraviolet light (EUV) reticle pod is designed to provide defect-free protection of EUV reticles during storage, handling and vacuum-transfer operations.
Impact® 8G Photochemical Filter
Impact 8G photochemical filter with its unique core-fill design and asymmetric filtration media delivers 3 nm cleanliness in a rapid-priming device that improves bubble clearance times to reduce chemical waste and downtime.
On 5 September 2012, Mr Jason Lee will share with you about The Most Advanced and Efficient Filter to Reduce Defects in Advanced Lithography Application at 1:00 pm -1:30 pm at level 4 same hall aisle N behind LED Taiwan Pavilion N1300 area Booth 056. For the latest agenda of Innovative Technology Center, click here.
Intercept® HPM 10 nm Filter
The Intercept HPM 10 nm filter is designed to remove particles and other contaminants from dilute liquid chemistries and solutions used in the wet etch and clean process at leading edge semiconductor fabs. The new filter uses surface modified, asymmetric ultra-high molecular weight polyethylene (UPE) membrane which is hydrophilic to provide the highest level of cleanliness and particle retention while maintaining high process flows.
Solutions for airborne molecular contamination control
Unprecedented challenges are emerging in today's photolithography bays. As feature size decreases, photoresist vulnerability increases and there is a growing risk for optics contamination. Molecular contaminants can alter the physical properties of photoresist, reducing the quality of the lithographic image on the wafer in the form of yield-limiting "t-topping." Entegris provides a portfolio of airborne molecular contamination control solutions.
Torrento wet etch and clean (WEC) filters provide 15 and 20 nm particle retention with ultra-high flow rate performance with a nondewetting Teflon® membrane. Optimized for leading edge recirculated bath processes, Torrento filter users can experience high yield, rapid bath cleanup cycles, extended filter life, fast changeouts and cleanliness – all in a prewet package for ease-of-use.
Now available in 1 1/4” sizes and expanded on a wide range of Entegris products:
Integra® 3/4” (DS12), 1” (DS16) and 1 1/4” (DS20) series valves
Chemlock® filter housing
NT® Pressure Transducers (coming soon)
CR 1/4" and 1/2” series valves
Designed to effectively handle temperatures up to 200°C (392°F) at 276 kPa (40 PSIG), the new PrimeLock series connection ensures leak-free performance in the most demanding chemical applications. At room temperature, PrimeLock fittings are rated at 827 kPa (120 PSIG). The ultraclean design provides enhanced reliability within your system, with an all-PFA wetted construction.
Watch PrimeLock Fitting Technology Overview
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Integra® DS20 1 1/4” Series Valve
Integra 1 1/4” series valve provides high flow capability with a Cv near 17 for use in chemical distribution units, valve box manifolds and wet processing equipment. All wetted surfaces are PFA and PTFE providing chemical resistance suitable for use with high-purity chemicals, solvents and deionized water.
Material solutions for leading edge lithography, deposition, etch and implant applications, through enhancement of strength, purity, thermal conductivity, stiffness and electrical properties.
High-purity Silicon Coatings
High-purity silicon coatings that protect chamber components while reducing metal contamination and defects.
New and Refurbished E-Chucks
Electrostatic chuck technology that provides for improved down time, therefore increased wafer cycles.