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In today's chemical mechanical planarization (CMP ) processes slurry filtration, post-CMP cleaning, pad maintenance and dispense control are critical enablers to success. Entegris provides an comprehesive portfolio of CMP and post-CMP cleaning technology advancements that empower tomorrows leading-edge nodes and enable today’s fabrication operations. Entegris is at the forefront of contamination control and precision slurry dispense solutions developments in CMP environments.
To find product information on Entegris fluid handling solutions, go to the Fluid Handling Product Catalog
Designed to serve the large volume slurry filtration needs for CMP Fab
Flow controllers, flowmeters, pressure transducers, proportional control valves, conductivity sensor and analyzer for CMP and point-of-use applications
Molded-through-the-core PP (polypropylene) PVA brushes
Installed at the point-of-dispense in the CMP tool
Designed to serve the inlet slurry feed to the CMP Tool