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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

CMP

Contamination control for CMP processes in Semiconductor and Data Storage manufacturing applications

In todays CMP (chemical mechanical planarization) processes slurry filtration, post-CMP cleaning and dispense control are critical enablers to success. Entegris provides an comprehesive portfolio of CMP and post-CMP cleaning technology advancements that empower tomorrows leading-edge nodes and enable today’s fabrication operations. Entegris is at the forefront of contamination control and precision slurry dispense solutions developments in CMP environments.

To find product information on Entegris filtration solutions, go to the Filtration Product Catalog

To find product information on Entegris fluid handling solutions, go to the Fluid Handling Product Catalog

To find product information on Entegris purification solutions, go to the Purification Product Catalog

To find product information on Entegris wafer handling solutions, go to the Wafer/ Reticle Handling Product Catalog

Filter products by Application or Process Step

Filter Results: Your selection returned the following items within this category.

Solaris® Filters Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Solaris® filters capture particles in silica, ceria or alumina slurries.	Planargard® Filters Designed for use in copper, STI, ILD and tungsten CMP applications to capture particles and gels in silica, ceria or alumina slurries.	Planarcore® PVA Brushes Planarcore® PVA brushes are designed to deliver superior performance and wafer-to-wafer uniformity in post-CMP wafer cleaning applications.
Planarcap® Filters Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Planarcap® filters capture particles in silica, ceria or alumina slurries.	Processgard® Filters Designed for use in Bulk CMP applications to capture particles and gels in silica, ceria or alumina slurries.