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Controlling sources of contamination and protecting wafers and reticles in process microenvironments are key challenges in photolithography applications. Entegris provides the industries most comprehensive portfolio of solutions to these problems: including liquid, air and gas filtration, gas diffusers, gas purifiers, photochemical dispense systems, immersion lithography ultrapure water purification systems, specialty coatings, premium graphite, silicon carbide, wafer and reticle transport, and reticle haze prevention technologies. Entegris is at the forefront of contamination control and microenvironment developments in photolithography applications.
Solutions for airborne molecular contamination control
High-performance, precision dispense systems for advanced photochemical and critical fluids
Designed for the removal of gaseous contaminants down to part-per-trillion levels with inorganic media.
ARC, BARC, TARC, Resists and SOD photochemicals used in photolithography applications
UPW purification, degassing, pressure and temperature control for immersion lithography scanner applications