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The cleanliness and flow process gases are critical to the success of vacuum processes in semiconductor manufacturing, including dry etch, deposition (CVD/PVD/Oxide), Ion Implant, EPI and RPT. Entegris provides reliable solutions to the material purity and flow performance challenge with its gas filtration and diffuser technologies.
Ultra-clean fast-vent gas diffusers to minimize particles and reduce vent times in load lock and transfer chambers.
Designed for ultrapure gas system filtration.