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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Wet Etch and Clean

Purity, materials management and process control solutions

Wet etch and clean (WEC) processes touch wafers more than any single application in the semiconductor fab. WEC processes modify and clean the wafer surface with a critical influence towards meet ing the demanding yield requirements of an effective fab. These processes utilize the most aggressive chemistries: strong acids, oxidizers, solvents, high temperatures and highly concentrated substances. The process materials and parameters must be controlled to levels other industries cannot achieve in terms of repeatability and consistency. Entegris provides the solutions to succeed under these extreme conditions.

To find product information on Entegris filtration solutions, go to the Filtration Product Catalog

To find product information on Entegris fluid handling solutions, go to the Fluid Handling Product Catalog

To find product information on Entegris purification solutions, go to the Purification Product Catalog

To find product information on Entegris wafer handling solutions, go to the Wafer/ Reticle Handling Product Catalog

Filter products by Application or Process Step

Filter Results: Your selection returned the following items within this category.

Chemlock® Housings Designed for tool space saving and easy filter cartridge changeout.	Etchgard™ Filters Designed for rapid particle removal in HF and BOE recirculation baths processes.	Fluorogard® Filters PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.
Fluoroline™ Filters Designed for filtration of high-purity process fluids at very low flow rates.	Guardian™ Filters Designed as a cost effective solution to a variety of chemistries: including high-pH solutions, copper and nickel plating applications.	Intercept® Filters Designed with a UPE membrane that provides sieving as well as physiosorption particle removal to provide ultra particle retention and process capabilities.
Protego® Filters/Purifiers Designed to remove metal ion contamination from ultrapure water and some organic solvents.	Pumpgard™ II Filters Designed to protect chemical pumps from wafer particles.	QuickChange® Filters Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries.
Rinsegard® Filters Designed for the removal of positively charged ions to sub-ppt levels in DI water.	Torrento™ Filters Designed for advanced wet etch and clean applications requiring the highest flow rate performance in aqueous chemistries.	Wafergard® Gas Filters Designed for ultrapure gas system filtration.