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Wet etch and clean (WEC) processes touch wafers more than any single application in the semiconductor fab. WEC processes modify and clean the wafer surface with a critical influence towards meeting the demanding yield requirements of an effective fab. These processes utilize the most aggressive chemistries: strong acids, oxidizers, solvents, high temperatures and highly concentrated substances. The process materials and parameters must be controlled to levels other industries cannot achieve in terms of repeatability and consistency. Entegris provides the process solutions to succeed under these extreme conditions.
Filtration Product Catalog Fluid Handling Product Catalog Purification Product Catalog
Wafer/Reticle Handling Product Catalog Fittings Mobile Selection Tool
Designed for tool space saving and easy filter cartridge changeout.
Designed for rapid particle removal in HF and BOE recirculation baths processes.
Valves, manifolds, fittings, tubing and pipe designed for use with high-purity corrosive chemicals.
PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.
Designed for filtration of high-purity process fluids at very low flow rates.
Designed as a cost-effective solution to a variety of chemistries: including high-pH solutions, copper and nickel plating applications.
Most advanced dual-retention filtration for critical DHF/BOE cleaning applications
Designed to remove metal ion contamination from ultrapure water and some organic solvents.
Designed to protect chemical pumps from wafer particles
Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries. All PTFE membranes.
Designed for advanced wet etch and clean applications requiring the highest flow rate performance in aqueous chemistries.
Designed for the removal of positively charged ions to sub-ppt levels in DI water.