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Wafergard II F-6 Gas Filters

Superior particulate filtration for ultrapure gas system filtration
 
Wafergard II F-6 Gas Filters
  • PTFE membranes provide high efficiency filtration
  • Low pressure drop reduces the risk of condensation in low vapor pressure gases
  • Excellent compatibility with all classes of semiconductor process gases
  • For use with inert and reactive gases, including ozone
 
Wafergard II F-6 Gas Filters
Materials:
Filter element: Patented Hydrophobic Teflon® PTFE membrane supported by molded Halar® ECTFE stacked disc supports with a direct housing seal

Housing: Electropolished 316L stainless steel

Surface finish interior: <=10 μin Ra

Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.
Downstream cleanliness:
Particles1: Less than 0.03 particles/liter (<1 particle/ft3) greater than 0.01 μm

Volatiles : <10 ppb moisture
Particle retention:
Greater than 99.9999999% (9 LRV) removal of all particles at 300 SLPM (referenced at the most penetrating particle size)
Removal rating:
>=0.003 μm
Operating conditions:
Maximum inlet pressure: 40 bar (600 PSIG) at 23°C

Maximum forward differential pressure: 4 bar (60 PSID) at 23°C (73°F)

Maximum reverse differential pressure: 0.7 bar (10 PSID) at 23°C (73°F)

Maximum operating temperature: 120°C (248°F)
Flow rating:
Refer to performance data
Notes:
1) Verified at 30 SLPM