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Wafergard III NF-30 In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

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Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 30 SLPM

Wafergard III NF-30 In-line Gas Filters

Materials:	Filter element: Patented, sintered nickel membrane filter.
	Housing: Electropolished F20 stainless steel housing
	Surface finish interior: <=5 μin Ra
	Helium leak rating: Qualified 2`10^-10 atm-cc/sec. Tested 1`10^-9 atm-cc/sec.
Downstream cleanliness:	Particles¹: Less than 0.03 particles/Liter (<1 particle/ft³) greater than 0.01 μm
	Volatiles²: Volatile outgassing of H₂O, O₂ and THC is below detectable limits (by RGA and FID at room temperature)
Particle retention:	Greater than 99.9999999% (9 LRV) removal of all particles at 30 SLPM. Greater than 99.9999% removal of all particles at 75 SLPM (referenced at the most penetrating particle size).
Removal rating:	>=0.003 μm
Operating conditions:	Maximum inlet pressure: 70 bar (1000 PSI) at 100°C
	Maximum forward/reverse differential pressure: 10 bar (150 PSID)
	Maximum operating temperature: Inert gases 400°C at 35 bar (500 PSI); Corrosive and reactive gases: 50°C at 70 bar (1000 PSI)
Flow rating:	Refer to performance data
Warranty:	5 year
Notes:	1) Particle cleanliness qualified following SEMASPEC Test Method for Particle Shedding (#93021511A-STD)
	2) Volatile cleanliness qualified following SEMASPEC Test Methods for: THC Contribution (#90120396B-STD), Moisture Contribution (#90120397B-STD), Oxygen Contribution (#90120398B-STD)