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Wafergard II F Micro In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration
 
Wafergard II F Micro In-line Gas Filters
  • PTFE membranes provide high efficiency filtration
  • Low pressure drop reduces the risk of condensation in low vapor pressure gases
  • Excellent compatibility with all classes of semiconductor process gases
  • For use with inert and reactive gases, including ozone
  • Compact footprint with a maximum diameter of 19.05 mm (0.75")
 
Wafergard II F Micro In-line Gas Filters
Materials:Filter element: Patented Hydrophobic Teflon® PTFE membrane supported by molded Teflon® PFA structure
Housing: Electropolished VAR 316L stainless steel
Surface finish interior: <=7 μin Ra
Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.
Downstream cleanliness:Particles: Less than 0.03 particles/liter (<1 particle/ft3
Volatiles: <10 ppb moisture
Particle retention:Greater than 99.9999999% (9 LRV) removal of all particles at 30 SLPM (referenced at the most penetrating particle size)
Removal rating:>=0.003 μm
Operating conditions:Maximum inlet pressure: 207 bar (3000 PSIG) at 23°C (73°F)
Maximum forward differential pressure: 4 bar (60 PSID) at 23°C (73°F)
Maximum reverse differential pressure: 0.7 bar (10 PSID) at 23°C (73°F)
Maximum operating temperature: 120°C (248°F)
Flow rating:Refer to performance data