header top curve
Home   >   Industries   >   Semiconductor   >   Photolithography   >   Enkiro™ Filters   >   Enkiro™ Filters

Industries

Select one or more of the following fields in order to begin your search.
  Search by Industry   Applications or process step   Keyword or Product Name      
   and/or   and/or      Search

Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Enkiro CF Filters

Ultrapure water filter for immersion lithography applications
 
  • Hydrophilic, surface modified UPE membrane spontaneously wets in water, eliminating prewetting requirements
  • 20 nm retention rating filters provide excellent small particle retention
  • Large membrane area delivers ultrapure water to the point-of-use rapidly and efficiently
  • Available in 10" and 20" cartridge lengths
 
Enkiro CF Filters
Materials:Membrane: Surface Modified UPE
Support: High Density Polyethylene (HDPE)
Core/Sleeve : High Density Polyethylene (HDPE)
O-Rings : Teflon® fluoropolymer encapsulated Viton® fluoroelastomer o-ring (TEV)
Connections:O rings: Code 0 (2-222) double o-rings
Dimensions (nominal):Length: 247.5 mm (10”)
Diameter: 83 mm
Membrane area:1.1 m2 (11.84 ft2)