header top curve
Home   >   Industries   >   Semiconductor   >   Photolithography   >   Impact® Filters   >   Impact® Mini Filters

Industries

Select one or more of the following fields in order to begin your search.
  Search by Industry   Applications or process step   Keyword or Product Name      
   and/or   and/or      Search

Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Impact Mini Filters

Rapid changeout UPE membrane filter for point-of-use photochemical filtration, including photoresists and solvents
 
Impact Mini Filters
  • Ultra low hold-up volume minimizes chemical waste, reduces opportunities for nucleation sites
  • Low surface area reduces chemical waste during filter startup
  • Lower surface area and elimination of a cage insures lower extractables and ultra cleanliness
  • Designed for use with IntelliGen® Mini dispense system
 
Impact Mini Filters
Materials:Membrane: Ultra-high molecular weight polyethylene (UHMWPE)
Supports (upstream, downstream, and mold): High-density polyethylene (HDPE)
O-ring: Kalrez® perfluoroelastomer, on filter
Maximum operating conditions:Maximum inlet pressure: 0.34 MPa (3.4 bar, 50 PSI) at 25°C (77°F)
Maximum forward/reverse differential pressure: 0.27 MPa (2.7 bar, 40 PSI) at 25°C (77°F)
Maximum operating temperature: 40°C (104°F)
Membrane area:250 cm2 (0.269 ft2)
Hold-up volume:<15 cc
Compatibility:PGMEA, PGME, NMP, Ethyl lactate, MMP and cyclohexanone
Wettability:Spontaneously wets in Butyl acetate, PGMEA, PGME, Ethyl lactate, MMP, ECA, NMP
Related Products