header top curve
Home   >   Industries   >   Semiconductor   >   Photolithography   >   Wafergard® Gas Filters   >   Wafergard® II SF Mini In-Line Gas Filters

Industries

Select one or more of the following fields in order to begin your search.
  Search by Industry   Applications or process step   Keyword or Product Name      
   and/or   and/or      Search

Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Wafergard II SF Mini In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration
 
Wafergard II SF Mini In-line Gas Filters
  • Patented stainless steel membrane provide high efficiency filtration
  • Ideal for high-temperature and dynamic-pressure applications
  • Excellent compatibility with most ultrapure semiconductor process gases
  • For use with inert and reactive gases
  • Typical use up to 30 SLPM
 
Wafergard II SF Mini In-line Gas Filters
Materials:Filter element: Patented stainless steel membrane filter
Housing: Electropolished 316L stainless steel
Surface finish interior: <=5 μin Ra
Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.
Downstream cleanliness:Particles: Less than 0.03 particles/liter (<1 particle/ft3) greater than 0.01 μm
Volatiles : <10 ppb moisture
Particle retention:Greater than 99.9999% (6 LRV) removal of all particles at 30 SLPM (referenced at the most penetrating particle size)
Removal rating:>=0.003 μm
Operating conditions:Maximum inlet pressure: 165 bar (2357 PSI) at 20°C
Maximum forward/reverse differential pressure: 140 bar (2000 PSID)
Maximum operating temperature: 460°C at 35 bar (500 PSI)
Flow rating:Refer to performance data
Warranty:2 year