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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, entegrisfuelcells.com, entegrislifesciences.com, pvprocesssolutions.com, or wafercare.com)

Air Filtration and Analytical Services

Solutions for airborne molecular contamination control

Unprecedented challenges are emerging in today's photolithography bays. As feature size decreases, photoresist vulnerability increases and there is a growing risk for optics contamination. Molecular contaminants can alter the physical properties of photoresist, reducing the quality of the lithographic image on the wafer in the form of yield-limiting "t-topping." Entegris provides a portfolio of airborne molecular contamination control solutions.

E2600 Filter Housing

Advanced protection for optics and resists

Hybrid media chemical air filters remove a full range of contaminants including acids, bases and condensable organics
Internal HEPA filters ensure particle control
Interstack sample ports allow filter performance monitoring, breakthrough-warming and intelligent filter change out planning
Small footprint saves cleanroom space
Rigid construction ensures reliable, trouble-free operation
Chemically clean construction materials ensure contamination-free air to the process tool
Dual inlet and outlet transitions for simple, hard or flexible duct connection to process tool air handling systems

Scanner Pre-Filter

Extends integrated OEM scanner protection from LMWSi organic compounds

Select adsorption chemistry to increase LMWSi and condensable organics efficiency
Ideal match to extend existing OEM scanner integral filtration system peformance
Easy retrofit to any installed scanner system
Dedicated team of analytical service experts to support understanding of all filtration system technology and airborne molecular contamination measurement pertaining to filter system interdependancy and life performance
Compliance to meet Nikon, ASML and Cannon environment specifications

SilverSet™ Chemical Filters

Advanced scanner optics and resist protection

Activated carbon media in inlet filter(s) prevents conversion of PGMEA to acetic acid, which can cause photoresist processing variation and material corrosion
Asymetric filter configuration prevents conversion of HDMSO to TMS, which causes scanner lens contamination
Hybrid filters containing highly-activated carbon plus advanced plymetric media removes a full range of contaminants including acids, bases and condensable organics
2-year filter lifetime at >99% removal efficiency for acids, bases and condensable organics in typical cleanroom photo bay conditions
Pleated filter design in rigid, deep frame optimizes active component surface area for maximum utilization and efficiency
Serial filter layout with interstack sampling ports provides multiple levels of protection and allows for filter performance monitoring and early break-through detection
Chemical filtration performance validated by Entegris Analytical Services, providing assurance that all filter performance claims are verified with supporting data.

Vaporsorb™ II AB Chemical Track Filter

Superior protection against acid and amine-based contaminants in Tokyo Electron Lithography Tracks

Protects against full range of total molecular acid and base gas phase contaminants
Guaranteed performance (when properly installed in accordance with OEM specifications)
Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
Long service life eliminates tool interruption and lowers cost of ownership

Vaporsorb™ II-ABC Lithography Track Chemical Air Filter

Superior protection against acids, amines and condensable organics in Tokyo Electron (TEL) LIthography Tracks

Protects against full range of total molecular gas phase acids, bases and condensable organics
Guaranteed performance (when properly installed in accordance with OEM specifications)
Guaranteed configuration fit of filter sizes for all lithography coat-snd-develop tracks
Long service life eliminates tool interruptions and lowers cost of ownership

Vaporsorb™ CSP HVAC

Superior protection against contaminants

A unique blended media with greater surface area removes a comprehensive array of AMCs in a single filter cell
Custom blends available to meet a specific list of target AMCs
High removal efficiency >95%
Removes critical acids, bases and organics from the fab ambient to reduce contamination risk
Low pressure drop reduces energy costs
Can be installed in built-up front/rear-access frame banks or side access housings or in ceiling-mounted fan units
Materials of construction certified zero off gas
Optimized for HVAC, high-flow make up air, Airborne Molecular Contamination Control
Removes a comprehensive array of AMCs in single filter cell

Vaporsorb™ II-THC Lithography Track Chemical Air Filter

Superior protection against the full range of total molecular base (TMB), gas phase contaminants

Protects against the full range of TMB gas phase contaminants
Guaranteed performance (when properly installed in accordance with OEM specifications)
Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
Long service life eliminates tool interruptions and lowers cost of ownership

Vaporsorb™ II VP

Superior protection against amine-based contaminants in Tokyo Electron Lithography Tracks

Protects against the full range of TMB gas phase contaminants
Guaranteed performance (when properly installed to OEM specifications)
Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
Long service life eliminates tool interruptions and lowers cost of ownership