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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, entegrisfuelcells.com, entegrislifesciences.com, pvprocesssolutions.com, or wafercare.com)

Gas Purification and Filtration

Designed for the removal of gaseous contaminants down to part-per-trillion levels with inorganic media.

Entegris' innovative gas microcontamination control products and technologies help ensure our customers are equipped with the latest technologies and are prepared for the challenges of tomorrow's advanced devices. One recent example is the CHS controlled humidity source used to introduce humidity to process and carrier gases such as CDA (clean dry air) and N₂, providing a continuous source of ultrapure humidified gas to the process tool.

Entegris' gas microcontamination control products include gas point-of-use and bulk purifiers, purifications systems, filters and diffusers.

GateKeeper® Carbon Monoxide Gas Purifiers

Cost-effective gas purification

Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Consistently delivers ultrapure gas
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Corrosive Gas Purifiers

Cost-effective gas purification

Consistently delivers ultrapure gas
Designed for use with HCl, Cl₂, HBr, BCl₃, SiCl₄ and SiF₄. The purifiers remove moisture to <1 ppb (part-per-billion) in N₂.
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Hydride Gas Purifiers

Cost-effective, environmentally friendly gas purification

Designed for use with NH₃, AsH₃, PH₃, SiH ₄, and GeH₄. The purifiers remove O₂, CO₂, H₂O and oxidation byproducts to sub-ppb (part-per-billion) levels.
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Hydrogen Gas Purifiers

Cost-effective, environmentally friendly gas purification

Consistently delivers ultrapure gas
Designed for use with H₂ and H₂/inert gas mixtures
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Inert Gas Purifiers

Cost-effective, environmentally friendly gas purification

Consistently delivers ultrapure gas
Designed for use with N₂, He, Ne, Kr, Xe, Ar, halocarbons and light hydrocarbons. The purifiers remove O₂, H₂, CO, CO₂ and H₂O to sub-ppb (part-per-billion) levels; SO₂ to sub-ppt (part-per-trillion) levels.
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Nonreactive Gas Purifiers

Cost-effective, environmentally friendly gas purification

Consistently delivers ultrapure gas
Designed for use with SF₆, O₂ , N₂ O and O₂ /inert gas mixtures. The purifiers remove CO₂ and H₂ O to sub-ppb (part-per-billion) levels; NMHCs to sub-ppt (part-per-trillion) levels.
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® Optics Gas Purifiers

Cost-effective, environmentally friendly gas purification

Consistently delivers ultrapure gas
Designed for use with CDA (clean dry air)
Guards against bulk gas purifier breakthrough, impurity spikes from liquid storage tanks, cylinder changeouts and unexpected contaminants in the process
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
Low pressure drop across purifiers

GateKeeper® 200M Bulk Gas Purifiers

High-flow gas purification

Consistently delivers ultrapure gas
Designed for use with CDA or inert gases
Guards against impurity spikes from liquid storage tanks and inconsistent supply gas quality
Does not release hydrocarbons that may contaminate the process
Uses ambient temperature purification technology – no power or heat required
High-flow gas purification

Aeronex® H Series Gas Purification Systems

Continuous ultrapure H₂ gas at a low cost of ownership

Removes gaseous contaminants such as H₂O, CO, CO₂, O₂ and nonmethane hydrocarbons to sub-ppb levels in hydrogen gas
Self-regenerating purifiers provide the lowest cost of ownership and eliminates environmental concerns
Complete automatic operation saves time, increases reliability
System runs at ambient temperature and is field retrofittable into existing lines with low pressure drop
Removes contaminants to sub-ppb (part-per-billion) and ppt (part-per-trillion) levels
Improves system safety by locating all purifiers in one cabinet, with multiple safety controls
Systems rated for up to 120 SLM, 300 SLM or 1000 SLM pure gas flow

Aeronex® I Series Gas Purification System

Continuous ultrapure N₂ at a low cost of ownership

Removes gaseous contaminants such as H₂O, CO, CO₂, O₂ and nonmethane hydrocarbons to sub-ppb levels in inert gases
Self-regenerating purifiers provide the lowest cost of ownership and eliminates environmental concerns
Complete automatic operation saves time, increases reliability
System runs at ambient temperature and is field retrofittable into existing lines with low pressure drop
Removes contaminants to sub-ppb (part-per-billion) and ppt (part-per-trillion) levels
Improves system safety by locating all purifiers in one cabinet, with multiple safety controls
Systems rated for up to 120 SLM, 300 SLM or 1000 SLM pure gas flow

Aeronex® SK Series Gas Purification System

Continuous ultrapure NH₃ gas at a low cost of ownership

Removes gaseous contaminants such as H₂O, CO₂, and O₂, to sub-ppb levels in ammonia gas
Self-regenerating purifiers provide the lowest cost of ownership and eliminates environmental concerns
Complete automatic operation saves time, increases reliability
System runs at ambient temperature and is field retrofittable into existing lines with low pressure drop
Systems rated for up to 120 SLM, or 300 SLM pure gas flow

Aeronex® Z Series Gas Purification System

Continuous ultrapure XCDA® purge gas at a low cost of ownership

Removes gaseous contaminants such as SO₂, SOX, NOX, H₂S, H₂O, CO₂, siloxanes, ammonia, amines, acid gasses, alcohols and non-methane hydrocarbons to sub-ppb levels in CDA (air) gas
Self-regenerating purifiers provide the lowest cost of ownership and eliminates environmental concerns
Complete automatic operation saves time, increases reliability
System runs at ambient temperature and is field retrofittable into existing lines with low pressure drop
Removes contaminants to sub-ppb (part-per-billion) and ppt (part-per-trillion) levels
Systems rated for up to 120 SLM, 500 SLM or 1000 SLM pure gas flow

Aeronex® Z2 Series Gas Purifiers

Continuous high-flow, point-of-use XCDA® (Extreme Clean Dry Air) purge gas at a low cost of ownership

Z2 media purifies to sub-ppt levels
Removes gaseous contaminants such as SO₂, SOX, NOX, H₂S, H₂O, CO₂, siloxanes, ammonia, amines, acid gases, alcohols and non-methane hydrocarbons to sub-ppb levels in CDA (air) gas
Self-regenerating purifiers provide the lowest cost of ownership and eliminates environmental concerns
Complete automatic operation saves time, increases reliability
System runs at ambient temperature and is field retrofittable into existing lines with low pressure drop
Systems rated for up to 5000 SLM, 10000 SLM, 15000 SLM, or 20000 SLM pure gas flow

Chambergard™ Fast Vent Diffusers

Dramatically reduces particles and vent times in load lock and transfer chambers

Increase system throughput by minimizing load lock vent cycle time
Provides rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber
Combines flow characteristics of a diffuser with a high-efficiency filter to increase efficiency and throughput

Chambergard™ BGN Fast Vent Diffusers

High-volume throughput and rapid venting to atmosphere

Rapid vent, gentle flow to atmosphere increases system throughput by minimizing load lock vent cycle time
Provides rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber
Patented, sintered nickel technology in a compact diffuser unit for excellent particle retention
Easy installation/retrofit into existing tools with minimal downtime

Chambergard™ FV50 Gas Diffuser

Efficient and robust Ni disk membrane

Rated at 1,000,000 cycles and designed to operate at higher inert pressure compared to first-generation Chambergard products
Entegris' industry-leading, patented, sintered nickel technology in a compact diffuser unit provides superior performance in all applications
Removal of particles greater than 0.003 µm from incoming gas minimizes wafer defects
Easy installation/retrofit into existing tools with minimal downtime (including load lock chambers, cooling chambers, transfer chambers and process chambers)
Manufactured, tested and packaged in a cleanroom to assure product cleanliness at time of installation
Rapid vent, gentle flow to atmosphere decreases cycle time, increases throughput and OEE

Chambergard™ II Max Gas Diffuser

High volume through and rapid venting to atmosphere gas diffuser

Chambergard™ II SF 3XP Mini XL Gas Diffusers

High volume throughput and rapid venting to atmosphere

High-flow, high-retention stainless steel diffusers decrease the number of diffusers in the chamber to achieve cost reductions
Rapid venting to atmosphere decreases cycle time and increases throughput
Removal of particles greater than 0.003 µm from incoming gas minimizes defects on wafers

Wafergard® Max 1000 In-line Teflon® Gas Filter

Superior particulate filtration for ultrapure gas applications - PTFE membrane

Large filtration area - 3X larger filtration, low pressure drop and high flow
Same length dimension as current filter generation, eliminating design changes of the gas panel or delivery system
Extended filter lifetime - 3X longer than earlier generation and reduced cost of ownership (COO)

Wafergard® II F Micro In-line Gas Filter

All-stainless steel gas filters for ultra-high purity gas filtration

Optimized high flow and high-retention 316L stainless steel filter element with 3x flow rate and 3-digit retention efficiency improvement over filter element
Standard size - ease of installation without design changes of gas panel or delivery system
All 316L stainless steel construction
Filter of choice for high-purity gas systems
Excellent gas compatibility with most semiconductor gases
Ideal for high-termperature and dynamic pressure applications

Wafergard® C2 1.125" C-Seal Surface Mount Sandwich Gas Filters

All-metal ultrapure filter dramatically reduces footprint

Provides the industry’s best filter in a surface-mount design
Inlet feed through to device mounted above provides filtration/protection of returning gas to ensure cleanliness for downstream devices
Available with nickel or stainless membrane

Wafergard® II F Micro In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

PTFE membranes provide high efficiency filtration
Low pressure drop reduces the risk of condensation in low vapor pressure gases
Excellent compatibility with all classes of semiconductor process gases
For use with inert and reactive gases, including ozone
Compact footprint with a maximum diameter of 19.05 mm (0.75")

Wafergard® II F-40 Gas Filters

Superior particulate filtration for ultrapure gas systems

PTFE membranes provide high efficiency filtration
Low pressure drop reduces the risk of condensation in low vapor pressure gases
Excellent compatibility with all classes of semiconductor process gases
For use with inert and reactive gases, including ozone

Wafergard® II F-6 Gas Filters

Superior particulate filtration for ultrapure gas system filtration

PTFE membranes provide high efficiency filtration
Low pressure drop reduces the risk of condensation in low vapor pressure gases
Excellent compatibility with all classes of semiconductor process gases
For use with inert and reactive gases, including ozone

Wafergard® II F Mini XL In-line Gas Filters

Superior particulate filtration for ultrapure gas systems

PTFE membranes provide high-efficiency filtration
Low pressure drop reduces the risk of condensation in low vapor pressure gases
Excellent compatibility with all classes of semiconductor process gases
For use with inert and reactive gases, including ozone

Wafergard® II SF Mini XL In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Patented stainless steel membrane provide high-efficiency filtration
Ideal for high-temperature and dynamic-pressure applications
Excellent compatibility with most ultrapure semiconductor process gases
For use with inert and reactive gases
Typical use up to 60 SLPM

Wafergard® III NF-30 In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 30 SLPM

Wafergard® III NF-75 In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 75 SLPM

Wafergard® III NF-750 Gas Filters

Superior particulate filtration for high-purity gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 750 SLPM

Wafergard® III NF Micro In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications

Wafergard® III NF Mini In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O₃ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 60 SLPM

Wafergard® III NF Mini XL In-Line Gas Filters

Superior particulate filtration for ultrapure gas system filtration

Cleanest, most efficient all-metal filters available
Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O³ and low-level hydride dopant gases.)
Ideal for high-temperature and dynamic-pressure applications
Typically used for flows up to 120 SLPM

Wafergard® GN Gas Filter Gun

Easy-to-use, lightweight POU gas filter

For point-of-use filtration of compressed gas
Rated for 0.003 μm particle retention in gas applications
Provides 10 cm² of effective filtration area for high flow rates
Nylon design, resistant to corrosion in acid and most solvent environments

Wafergard® GTL In-line Gas Filters

Remove particles from inert gases for flow rates up to 80 SLPM

Efficient, low-cost point-of-use filtration of inert gases
For flow rates up to 80 SLPM

Wafergard® GT-Plus In-line Gas Filters

Remove particles from inert gases for flow rates up to 30 SLPM

Efficient, low-cost point-of-use filtration of inert gases
For flow rates up to 30 SLPM

Wafergard® MAX In-line Teflon® Gas Filters

Superior particulate filtration for ultrapure gas applications

All Teflon® filter element provides the industry’s best performance for ultrapure applications
Excellent compatibility with all classes of semiconductor process gases as well as general nitrogen and CDA applications
Specifically designed for high flow and low delta pressure applications
For use with inert and reactive gases, including ozone
Pre-conditioned for fast startup (Silver only)
Select ultrahigh purity (Silver) or high purity (Bronze) surface finish

Wafergard® T-line Gas Filters

Clean, dry air for industrial applications

Flow rates of up to 1500 SLPM (50 SCFM)
Effectively retains particles of 0.003 μm size and above
Easy filter replacement without breaking gas line connections
For use in non-toxic and non-flammable inert gas
Available with 6-stack, 12-stack and 40-stack gas cartridge filters