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Photochemical Filtration

High-purity, UPE, nylon polyimide membranes
Application Note (1063100)

 

Liquid filtration of photochemicals used in photolithography applications such as: Resists, ARC, BARC, TARC, SOD and Dielectrics. The filters are available in a nylon, UPE (ultra high molecular weight polyethylene) and polyimide membranes with various disposable filter sizes and form factors to work with many dispense systems. 
Impact® 8G Filters
Impact 8G delivers 3 nm cleanliness in a rapid-priming device that improves bubble clearance times to reduce chemical waste and downtime
  • Unique and patented membrane technology down to 3 nm reduces on-wafer defects
  • Asymmetric membrane with tighter retention and lower pressure drop performance
  • Optimized core fill flowpath specifically designed to enable reduce priming/degas time
  • Designed for use in Point-of-Use (POU) photochemical filtration and ink processing applications
Impact® 2 Filter Family
Rapid change-out UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents
  • Developed for use with the Impact® 2 manifold and IntelliGen® dispense systems
  • Point-of-use photochemical and solvent filtration
  • Minimal chemical exposure, rapid connection design
  • UPE and surface modified UPE membrane technology
  • Low hold-up volume minimizes chemical waste
Impact® Mini Filters - Ultra-low hold-up volume
Rapid change-out UPE membrane filter for point-of-use photochemical filtration, including photoresists and solvents
  • Ultra-low hold-up volume minimizes chemical waste, reduces opportunities for nucleation sites
  • Low-surface area reduces chemical waste during filter startup
  • Lower surface area and elimination of a cage insures lower extractables and ultra cleanliness
  • Designed for use with IntelliGen® Mini dispense system
Impact® Asymmetric Disposable Filters
Rapid change-out UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents. Available in 5 nm and 10 nm retention ratings
  • Available in 5 nm retention rating - tightest membrane technology to meet critical line-width processes
  • Design optimized for use with the Impact® manifold and IntelliGen® dispense systems; extremely clean for metal ions and extractables
  • Minimal chemical exposure, rapid connection design, allows quick filter installation and minimizes downtime while limiting the handling of hazardous chemicals during the installation and disposal processes, thereby promoting a more healthy workplace
  • Small footprint allows installation of more filters on tools for advanced systems
  • Low hold-up volume minimizes chemical waste
  • New pleating technology: Impact V2 5 nm and 10 nm products incorporate more membrane within the same 0.03 μm and 0.05 μm Impact V2 filters, providing the footprint and benefits of ultra fine retention without a flow or pressure drop penalty
  • Proprietary cleaning technology ensures low metals and organic extractables, eliminating another variable to the customer’s process
Impact® Plus Filter
Point-of-use filter for photochemicals, including photoresists and solvents
  • Ultra-high molecular weight polyethylene (UPE) membrane technology
  • Rapid filter change-out design
  • Low hold-up volume limits chemical waste
  • Designed for use with the Impact® ST manifold and IntelliGen® Mini dispense system
Microgard™ LE Nylon Cartridge Filters
Hydrophillic polyamide filters for bulk filtration applications
  • Hydrophillic polyamide filters with superior cleanliness, ideal for aqueous and organic solutions
  • Available in 10 and 20 nm retention ratings - validated with Entegris FS sub-30 nm retention rating test method
  • Unique nylon membrane design that enables both optimum retention and maximum flow
  • Proprietary cleaning technology to meet the needs of more sophisticated resists
Optimizer® Point-of-Use Filter Family
Photochemical filters for point-of-use (POU) applications
  • Advanced filtration media: optimizes filtration and particle retention capabilities
  • DI water, solvents and other photochemical filtration applications
  • UPE membrane spontaneously wets and stays wet in solvents