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Chambergard™ Gas Diffusers

Fast vent diffusers with no introduction or disturbance of particles in process chambers
Application Note (592924)

 

Chambergard™ fast vent diffusers provide rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber, increasing system throughput by minimizing load lock vent cycle times. They combine the flow characteristics of a diffuser with a high-efficiency filter to increase efficiency and throughput.

Gentle flow characteristics in a clean diffuser/filtration media offer increased throughput with rapid venting to atmosphere. Ultrapure, diffused gas is delivered to the process chamber, minimizing on-wafer defects. Diffusers are compatible with most system designs for easy installation or retrofit into load lock chambers, cooling chambers, transfer chambers and process chambers.
Chambergard™ FV50 Gas Diffuser
Efficient and robust Ni disk membrane
  • Rated at 1,000,000 cycles and designed to operate at higher inert pressure compared to first-generation Chambergard products
  • Entegris' industry-leading, patented, sintered nickel technology in a compact diffuser unit provides superior performance in all applications
  • Removal of particles greater than 0.003 µm from incoming gas minimizes wafer defects
  • Easy installation/retrofit into existing tools with minimal downtime (including load lock chambers, cooling chambers, transfer chambers and process chambers)
  • Manufactured, tested and packaged in a cleanroom to assure product cleanliness at time of installation
  • Rapid vent, gentle flow to atmosphere decreases cycle time, increases throughput and OEE
Chambergard™ II Max Gas Diffuser
High volume through and rapid venting to atmosphere gas diffuser
    Chambergard™ II SF 3XP Mini XL Gas Diffusers
    High volume throughput and rapid venting to atmosphere
    • High-flow, high-retention stainless steel diffusers decrease the number of diffusers in the chamber to achieve cost reductions
    • Rapid venting to atmosphere decreases cycle time and increases throughput
    • Removal of particles greater than 0.003 µm from incoming gas minimizes defects on wafers
    Chambergard™ Fast Vent Diffusers
    Dramatically reduces particles and vent times in load lock and transfer chambers
    • Increase system throughput by minimizing load lock vent cycle time
    • Provides rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber
    • Combines flow characteristics of a diffuser with a high-efficiency filter to increase efficiency and throughput
    Chambergard™ BGN Fast Vent Diffusers
    High-volume throughput and rapid venting to atmosphere
    • Rapid vent, gentle flow to atmosphere increases system throughput by minimizing load lock vent cycle time
    • Provides rapid venting to atmosphere without disturbing or adding particles to wafers in the chamber
    • Patented, sintered nickel technology in a compact diffuser unit for excellent particle retention
    • Easy installation/retrofit into existing tools with minimal downtime