Designed to prevent defect-causing agglomerate gels from reaching the wafer surface
Point-of-Use (POU) and bulk chemical mechanical planarization (CMP) filters enable process advancements to address two key end-user needs: reduce defects and improve cost of ownership (COO). Entegris provides a full line of CMP slurry filters for Point-of-Tool (POT), Point-of-Dispense (POD) and bulk/facility applications.
Do you prefer to search by product name? The full line of Entegris CMP slurry filters is available by product name. Chemlock®, Planarcap®, Planargard®, Solaris®
Are you trying to determine which Entegris filter is right for your CMP slurry application? Our recommendations are provided in the section below by the location of the filter in the CMP slurry delivery path.