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Liquid Filtration

Contaminination control of process liquids in semiconductor, flat panel display and data storage manufacturing applications

Contamination control continues to evolve and enable the technological advancements and yield improvements in semiconductor, flat panel and data storage manufacturing. CMP slurries, WEC acids, photochemistry and DI water all require advanced filtration to remove defect-causing particles and agglomerate before reaching the wafer or substrate surface. Entegris provides a full line of filters to solve the contamination control challenges our customers face.

 

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Filter Results: Your selection returned the following items within this category.
Chemlock® Housings

Designed for tool space saving and easy filter cartridge changeout.

Enkiro™ Filters

Designed for ultrapure water filtration in semiconductor applications.

Etchgard™ Filters

Designed for rapid particle removal in HF and BOE recirculation baths processes.

Fluorogard® Filters

PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.

Fluoroline™ Filters

Designed for filtration of high-purity process fluids at very low flow rates.

Guardian™ Filters

Designed as a cost effective solution to a variety of chemistries: including high-pH solutions, copper and nickel plating applications.

Impact® Filters

Designed for point-of-use (POU) photochemical applications with BARC, Resist , TARC and Spin-On Dielectric materials.

Intercept® Filters

Designed with a UPE membrane that provides sieving as well as physiosorption particle removal to provide ultra particle retention and process capabilities.

Microgard™ Filters

Designed for high retention efficiency water, chemical and photochemical applications.

Optimizer® Filters

Designed to control particles in many photochemicals: including solvents and DI Water.

Panelgard™ Filters

Designed for point-of-use filtration in flat panel display manufacturing applications.

Planarcap® Filters

Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Planarcap® filters capture particles in silica, ceria or alumina slurries.

Planargard® Filters

Designed for use in copper, STI, ILD and tungsten CMP applications to capture particles and gels in silica, ceria or alumina slurries.

Processgard® Filters

Designed for prefiltration of DI Water and process chemistries.

Pumpgard™ II Filters

Designed to protect chemical pumps from wafer particles.

QuickChange® Filters

Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries. 

Rinsegard® Filters

Designed for the removal of positively charged ions to sub-ppt levels in DI water.

Solaris® Filters

Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Solaris® filters capture particles in silica, ceria or alumina slurries.

Torrento™ Filters

Designed for advanced wet etch and clean applications requiring the highest flow rate performance in aqueous chemistries.