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Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)

Liquid Filtration

Contamination control of process liquids

Contamination control continues to evolve and enable the technological advancements and yield improvements in semiconductor, flat panel, data storage and photovoltaic cell manufacturing. CMP slurries, acids, bases, photochemistry and DI water all require advanced filtration to remove defect-causing particles and agglomerate before reaching the wafer or substrate surface. Entegris provides a full line of filters to solve the contamination control challenges our customers face.

How do you prefer to select Entegris filters? Product Name, Membrane/Media or Chemical Application?

Product: Chemlock®, Fluorogard®, Fluoroline®, Guardian®, Impact®, Intercept®, Microgard®, Optimizer®, Panelgard®, Planarcap®, Planargard®, Processgard®, QuickChange®, Solaris®, Thermogard™ Torrento®

Membrane: UPE, PTFE, PES, PP, Nylon, Composite (DUO)

Media: Depth

Chemical Application: Please see the section below.

Acids and Bases - Aggressive SC1, SC2, SPM, Nitride Etch and Resist Stripper in high-temperature and outgassing conditions with elevated concentration	Acid - Weak Non-oxidizing acids: acetic, citris, HCL, HF, weak SC2 cleans, BOE used at low concentration, low pH, moderate temperature (60-80°C)	Base - Weak SC1, NH₄OH, amines and basic resist strippers in low concentration and temperature conditions
CMP Slurry Silica, ceria and alumina CMP slurries used in point-of-use and bulk applications	DI Water Deionized (DI) water filtration for use in fab environments and chemical development/manufacture/test applications	Electroplating Cu and Ni electroplating/deposition applications
Housings Polymer and stainless steel housings for cartridge filters	Laboratory Lab bench, pilot line to scale-up filters used in chemical development projects	Photochemical ARC, BARC, TARC, Resists and SOD photochemicals used in photolithography applications
Purification Ultrapure DI water and chemistry at various temperatures and concentrations	Resist Stripper - Aqueous Photoresist, photoresist residue removal and solvent-based chemistries (aqueous acids and bases) at high and low temperatures	Resist Stripper - Nonaqueous Photoresist, photoresist residue removal and solvent-based chemistries (nonaqueous) with NMP at high and low temperature
Solvents (Organic)/IPA Organic solvents, Amine-based TMAH, used for chemical dilution, rinsing and cleaning at elevated temperatures (>60°C)