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Contamination control continues to evolve and enable the technological advancements and yield improvements in semiconductor, flat panel and data storage manufacturing. CMP slurries, WEC acids, photochemistry and DI water all require advanced filtration to remove defect-causing particles and agglomerate before reaching the wafer or substrate surface. Entegris provides a full line of filters to solve the contamination control challenges our customers face.
Designed for tool space saving and easy filter cartridge changeout.
Designed for ultrapure water filtration in semiconductor applications.
Designed for rapid particle removal in HF and BOE recirculation baths processes.
PTFE membrane filter designed to efficiently remove particles from a broad range of acids, bases, solvents and other process chemicals.
Designed for filtration of high-purity process fluids at very low flow rates.
Designed as a cost effective solution to a variety of chemistries: including high-pH solutions, copper and nickel plating applications.
Designed for point-of-use (POU) photochemical applications with BARC, Resist , TARC and Spin-On Dielectric materials.
Designed with a UPE membrane that provides sieving as well as physiosorption particle removal to provide ultra particle retention and process capabilities.
Designed for high retention efficiency water, chemical and photochemical applications.
Designed to control particles in many photochemicals: including solvents and DI Water.
Designed for point-of-use filtration in flat panel display manufacturing applications.
Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Planarcap® filters capture particles in silica, ceria or alumina slurries.
Designed for use in copper, STI, ILD and tungsten CMP applications to capture particles and gels in silica, ceria or alumina slurries.
Designed for prefiltration of DI Water and process chemistries.
Designed to protect chemical pumps from wafer particles.
Designed for use in advanced liquid filtration with both aqueous and non-aqueous chemistries.
Designed for the removal of positively charged ions to sub-ppt levels in DI water.
Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Solaris® filters capture particles in silica, ceria or alumina slurries.
Designed for advanced wet etch and clean applications requiring the highest flow rate performance in aqueous chemistries.