Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, wafercare.com, entegris-services.com, or entegrisfuelcells.com)
Contamination control continues to evolve and enable the technological advancements and yield improvements in semiconductor, flat panel, data storage and photovoltaic cell manufacturing. CMP slurries, acids, bases, photochemistry and DI water all require advanced filtration to remove defect-causing particles and agglomerate before reaching the wafer or substrate surface. Entegris provides a full line of filters to solve the contamination control challenges our customers face.
SC1, SC2, SPM, Nitride Etch and Resist Stripper in high temperature and outgassing conditions with elevated concentration
Non-oxidizing acids: acetic, citris, HCL, HF, weak SC2 cleans, BOE used at low concentration, low pH, moderate temperature (60-80°C)
SC1, NH4OH, amines and basic resist strippers in low concentration and temperature conditions
Silica, ceria and alumina CMP slurries used in point-of-use and bulk applications
Deionized (DI) water filtration for use in fab environments and chemical development/manufacture/test applications
Cu and Ni electroplating/deposition applications
Polymer and stainless steel housings for cartridge filters
Lab bench, pilot line to scale-up filters used in chemical development projects
ARC, BARC, TARC, Resists and SOD photochemicals used in photolithography applications
Ultrapure DI water and chemistry at various temperatures and concentrations
Photoresist, photoresist residue removal and solvent-based chemistries (aqueous acids and bases) at high and low temperatures
Photoresist, photoresist residue removal and solvent-based chemistries (nonaqueous) with NMP at high and low temperature
Organic solvents, Amine-based TMAH, used for chemical dilution, rinsing and cleaning at elevated temperatures (>60°C)