Semiconductor cleaning applications are evolving into more aggressive and higher temperature chemistry to improve wafer cleaning efficiency. Here at Entegris, our technology is advancing to meet these growing needs with solutions that can withstand aqueous media temperatures up to 180°C (356°F). For higher temperature applications, Espy® sensing solutions can withstand corrosive environments and temperatures up to 200°C (392°F). High-temperature solutions are designed for a multitude of applications; wafer cleaning, wet etch and clean equipment, photoresist stripping, ultrapure sensing, precision blending and metering and system diagnostics. Nonmetallic materials, PFA and PTFE increase compatibility within your system. Common media is SPM, sulfuric peroxide mixture; HPM, hydrogen chloride peroxide mixture; hydrofluoric acid, sulfuric acid and peroxide.