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Unprecedented challenges are emerging in today's photolithography bays. As feature size decreases, photoresist vulnerability increases and there is a growing risk for optics contamination. Molecular contaminants can alter the physical properties of photoresist, reducing the quality of the lithographic image on the wafer in the form of yield-limiting "t-topping." Entegris provides a portfolio of airborne molecular contamination control solutions.
Designed for Track/Coater/Developer chemical filtration of airborne molecular contamination
Protection from acid, base and condensable organic contamination in lithography stepper/scanners
Protection from acid, base and condensable organic contamination in lithography track tools
Analysis and reporting of airborne molecular contamination in high-tech environments