Solutions for airborne molecular contamination (AMC) control
Unprecedented challenges are emerging in today's wafer fabs. As feature sizes continue to decrease, the number of potential contaminants has increased, and the tolerable concentrations of those contaminants have decreased. It is necessary to control contaminants in the entire fab to protect both process equipment and wafers from the damaging effects of AMC. Entegris provides a portfolio of airborne molecular contamination control solutions.
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Designed for chemical filtration of airborne molecular contamination in wafer fabs
Stepper and Scanner
Protection from acid, base and condensable organic contamination in lithography stepper/scanners
Protection from acid, base and condensable organic contamination in lithography track tools
Analysis and reporting of airborne molecular contamination in high-tech environments
Non-litho Process Tools
Protection from acid, base and condensable organic contamination in all non-litho semiconductor process tools