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AMC Filtration

Solutions for airborne molecular contamination (AMC) control

Unprecedented challenges are emerging in today's wafer fabs. As feature sizes continue to decrease, the number of potential contaminants has increased, and the tolerable concentrations of those contaminants have decreased. It is necessary to control contaminants in the entire fab to protect both process equipment and wafers from the damaging effects of AMC. Entegris provides a portfolio of airborne molecular contamination control solutions.

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Filter Results: Your selection returned the following items within this category.

Cleanroom Filtration Designed for chemical filtration of airborne molecular contamination in wafer fabs	Stepper and Scanner Protection from acid, base and condensable organic contamination in lithography stepper/scanners	Track Protection from acid, base and condensable organic contamination in lithography track tools
Analytical Services Analysis and reporting of airborne molecular contamination in high-tech environments	Non-litho Process Tools Protection from acid, base and condensable organic contamination in all non-litho semiconductor process tools