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Entegris' innovative gas microcontamination control products and technologies help ensure our customers are equipped with the latest technologies and are prepared for the challenges of tomorrow's advanced devices, photovoltaics, life sciences and lithium ion batteries. One recent example is the CHS controlled humidity source used to introduce humidity to process and carrier gases such as CDA (clean dry air) and N2, providing a continuous source of ultrapure humidified gas to the process tool.
Interested in learning more about the gas contamination challenges in leading-edge lithography? Watch a recent Solid State Report from Solid State Technology.
Designed for the removal of gaseous contaminants down to part-per-trillion levels in continuous high-flow systems.
Designed for the removal of gaseous contaminants down to part-per-trillion levels with inorganic media.
Need help selecting the right purifer for your requirements?
Entegris offers our new Gas Purifier Selection Wizard to help you through the process. Just click on the link below!
Designed for the removal of AMC in inert gases such as CDA and N2.