Products

Driven by continually shrinking feature sizes and adoption of ever more fragile materials in IC manufacturing, it has become crucial to develop effective and low impact processes that are benign to features on wafers. Recently, trends towards dilute chemistries and progress in megasonic cleaning have brought renewed interest in gasified DI water.

Typical High Purity Water Gasification Applications
The following list illustrates some of the novel wet clean applications involving various gases dissolved in ultrapure DI water:

• Organic removal with ozone-DI water
• CO₂-DI water rinsing to eliminate static charge on wafers
• Megasonic particle cleaning with N₂-DI water, H₂-DI water
• pH adjustment with CO₂ - DI water, NH₃-DI water
• Corrosion control in BEOL cleaning with CO₂-DI water
• Photomask (including EUV mask) with ozone-DI water, H₂-DI water and CO₂-DI water