AMC Filtration
Unprecedented challenges are emerging in today's photolithography bays. As feature size decreases, photoresist vulnerability increases and there is a growing risk for optics contamination. Molecular contaminants can alter the physical properties of photoresist, reducing the quality of the lithographic image on the wafer in the form of yield-limiting "t-topping."
Minute amounts of condensable organic contaminants can cause damaging films to form on 248 nm and 193 nm optical elements, degrading scanner performance and reducing tool life. Similarly, optical inspection tools and advanced reticles are at risk of damage due to haze formation from molecular contamination.
Entegris is the leader in molecular contamination measurement and control. Our filtration systems are used on lithography equipment from every major exposure tool and track system supplier in fabs around the world.
Entegris offers a comprehensive suite of OEM-approved filtration and analytical services to safeguard deep UV lithography processes. Entegris can help you understand your fab's unique molecular contamination challenge and provide a failsafe contamination control system to protect lithography optics and resist processes.