Liquid Filtration
Entegris' liquid filtration solutions enable critical processes that yield the world's leading technologies. Our filtration solutions enhance yield, reduce downtime, deliver high flow rates, simplify installations, stabilize processes, and lower total cost of ownership. Our patented ultra-high molecular weight polyethylene (UPE) membrane technology has the highest retention efficiency of any membrane and boast optimum wetting capability. The UPE membranes prevent micro-bubble, and improves bubble clearing, gel particle retention, and hard particle retention.
In CMP application, Entegris' filtration solutions tackle the challenge to remove large, defect-causing particles without ridding the smaller particles needed for the application. To minimize presence of unwanted particles in CMP, Entegris provides filtration solutions for four critical locations in the process, intake, post-dilution, distribution loop and at the tool (point-of-use). Solaris® filters are long-life, multi-stage filters designed for point-of use filtration and remove particles from fine slurries in Copper and STI processes to larger particles in Oxide and other Metal processes. Solaris® filtration solution, which combines Solaris® filter with manifolds, provides long lasting, easy-to-use, disposable methods of reducing defect causing particles, gels, and agglomerates while simultaneously allowing working particles to pass. Solaris® filtration technology boasts greater than 2x the life of conventional depth filters in the most demanding CMP applications.
In wet etch and clean (WEC) process, Entegris's filtration solutions respond to challenges from residual dielectric etch and clean in front-end-of-the-line, to dry ash clean and solvent-based clean in back-end-of the line. Entegris' WEC filtration solutions utilize our superior membrane technologies for maximum retention efficiency, high flow rate, greatest particle removal, and longest filter life. QuickChange® filters, with nondewetting membrane technology, are ideal for aqueous based chemical process. Fluorogard® filters, with PTFE membrane for hard particle retention, are designed for photo-resist stripping and residue removal. Intercept® filters optimized high flow UPE membrane to yield dual particle technologies for maximum particle removal. They are ideally suited for batch bath, single wafer tool, and chemical delivery system for diluted HF and BOE. Guardian® filters, with patented hydrophilic UPE membrane, provides the best retention efficiency and the lowest particle counts in chemical delivery systems for HF, BOE, NH4F, copper Plating Solution, and Super-Q etch.
For photolithography application, Entegris provides solutions capitalizing on UPE membrane technologies, and revolutionary filter designs. Entegris developed low hold-up volume disposable (LHVD) device that provides minimum hold-up volume, fastest filter changeout, safest guard against hazardous materials, optimum flowpath, and highest flow rate. Impact® Plus Filters optimizes the LHVD filter design suited for use with most lithography chemicals, including low-k dielectrics, photoresists, antireflective coatings (TARC & BARC), and spin-on polymers. Optimizer® DEV filters for developer and Optimizer® DI for DI water are based on UPE material made hydrophilic to aid wetting characteristics. Optimizer® PCM, Impact® 2 PCM, and Impact® plus PCM filters are based on UPM membrane technology, a modification of UPE membrane technology for compatibility with top antireflective coatings (TARC) and hole shrink applications.