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Vaporsorb™ II-ABC Lithography Track Chemical Air Filter

Superior protection against acids, amines and condensable organics in Tokyo Electron (TEL) LIthography Tracks
Data Sheet (404129)
 
Vaporsorb™ II-ABC Lithography Track Chemical Air Filter
  • Protects against full range of total molecular gas phase acids, bases and condensable organics
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-snd-develop tracks
  • Long service life eliminates tool interruptions and lowers cost of ownership
 
Vaporsorb™ II-ABC Lithography Track Chemical Air Filter
Materials:
 Casing: 0.060" clear anodized aluminum

Media: CSP36

Cover screens: 0.060" clear anodized aluminum

Gasket, if used: 0.25" x 0.5" closed cell polypropylene, downstream side only

Handle, if used: 3/8" black nylon, end of filter, on center

Acids
hydrocholoric
Hydrofluoric
Sulfur Dioxide
Nitric

Amines
Ethylamine
Diethylamine
Ammonia
NMP

Condensable Organics**
PGMEA
Benzene
Butylated Hudrotouene
Heptadecane

 

*Examples of common contaminants captured
**C6 - C30