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Vaporsorb™ II AB Chemical Track Filter

Superior protection against acid and amine-based contaminants in Tokyo Electron Lithography Tracks
Data Sheet (401475)
 
Vaporsorb™ II AB Chemical Track Filter
  • Protects against full range of total molecular acid and base gas phase contaminants
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
  • Long service life eliminates tool interruption and lowers cost of ownership
 
Vaporsorb™ II AB Chemical Track Filter
Materials:
 Casing: 0.060" clear anodized aluminum

Media: CSP36

Cover screens: 0.060" clear anodized aluminum

Gasket, if used: 0.25" x 0.5" closed cell polyethlyene

Handle, if used: 3/8" black nylon, end of filter, on center

Acids
Hydrochloric
Hydrofluoric
Sulfur Dioxide
Nitric

Amines
Ethylamine
Diethylamine
Ammonia
NMP

 

Examples of common contaminants captured.