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Vaporsorb™ II-THC Lithography Track Chemical Air Filter

Superior protection against the full range of total molecular base (TMB), gas phase contaminants
Data Sheet (520637)
 
Vaporsorb™ II-THC Lithography Track Chemical Air Filter
  • Protects against the full range of TMB gas phase contaminants
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
  • Long service life eliminates tool interruptions and lowers cost of ownership
 
Vaporsorb™ II-THC Lithography Track Chemical Air Filter

Amines
Ethylamine
Diethylamine
Ammonia
NMP

 

Examples of common contaminants captured.

Casing:
 0.060" clear anodized aluminum
Media:
 Vaporsorb II
Cover screens:
 0.060" clear anodized aluminum, 1 layer without scrim
Gasket, if used:
 0.25" x 0.5" closed cell polyethylene, downstream side only
Handle, if used:
 3/8" black nylon, end of filter, on center