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SilverSet™ Chemical Filters

Advanced scanner optics and resist protection
Data Sheet (456800)
 
SilverSet™ Chemical Filters
  • Activated carbon media in inlet filter(s) prevents conversion of PGMEA to acetic acid, which can cause photoresist processing variation and material corrosion
  • Asymetric filter configuration prevents conversion of HDMSO to TMS, which causes scanner lens contamination
  • Hybrid filters containing highly-activated carbon plus advanced plymetric media removes a full range of contaminants including acids, bases and condensable organics
  • 2-year filter lifetime at >99% removal efficiency for acids, bases and condensable organics in typical cleanroom photo bay conditions
  • Pleated filter design in rigid, deep frame optimizes active component surface area for maximum utilization and efficiency
  • Serial filter layout with interstack sampling ports provides multiple levels of protection and allows for filter performance monitoring and early break-through detection
  • Chemical filtration performance validated by Entegris Analytical Services, providing assurance that all filter performance claims are verified with supporting data.
 
SilverSet™ Chemical Filters

 


Contaminant		Filter
Capture		Removal
Efficiency		Typical
Lifetime
Bases
(e.g., NH3, NMP, Amines)		Excellent>99%>2 years**
Acids and acid forming species
(e.g., HCl, HNO2, H2SO4, HNO3, SO2)		Excellent>99%>2 years**
Condensable organics*
(e.g., Toluene, HMDSO, PGMEA)		Excellent>99%>2 years**
*Boiling point >150°C and/or molecular weight >120
**Lifetimes are given for 99% removal efficiency (RE). Running to 90% RE yields much higher lifetimes.
Based on typical cleanroom AMC levels: acids </=1 ppb; bases </=10 ppb and condensable organics
</=20 ppb