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SilcoMax™ Coating

Ultrapure silicon carbide coating
 
  • Applications in semiconductor equipment
  • Oxidation protection, especially in the presence of moisture
  • Innovative low temperature plasma process to deposit a variety of silicon carbide coatings
  • Dense, micro-conformal, high purity coatings have very low residual stress
  • High purity, dense and micro-conformal coating technology
 
SilcoMax™ Coating
SubstrateCompatibility: Most metals and ceramics
Size: Up to 91.4 cm (36”)
Geometry: Any shape, including complex geometries
StructureAmorphous
TemperatureDeposition: <150˚C (302˚F)
Use: 1000˚C (1832˚F)
Coating thicknessA few nm to over 60 μm
Electrical resistivity˜108 Ω-cm
Hardness1600 DPHN
Purity99.95%
ResistanceWear/Abrasion: Very Good
Corrosion: Very good high-temperature oxidation resistance in air up to 1000˚C (1832˚F)
Corrosion: Excellent aqueous corrosion resistance including acids and alkalis