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Transimax™ Coating

Transparent hard silicon nitride coating
 
  • Low temperature vacuum plasma process to deposit a series of Silicon Nitride coatings
  • Suitable for high-temperature oxidation/corrosion protection of ceramic materials
  • Reduces particles during semiconductor wafer processing
  • Excellent breakdown voltage
  • Optically transparent
 
Transimax™ Coating
SubstrateCompatibility: Most metals and ceramics
Size: Up to 91.4 cm (36”)
Geometry: Any shape, including complex geometries
StructureAmorphous
TemperatureDeposition: <150˚C (302˚F)
Use: 1000˚C (1832˚F)
Coating ThicknessA few nm to over 100 μm
Electrical resistivity˜1013 Ω-cm
Hardness1200 DPHN
Purity99.95%
ResistanceWear/Abrasion: Very good
Corrosion: Very good high-temperature oxidation resistance in air up to 1000˚C (1832˚F)
Corrosion: Excellent aqueous corrosion resistance