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Wafergard® III NF-75 In-line Gas Filters

Superior particulate filtration for ultrapure gas system filtration
Data Sheet (71210)
 
Wafergard® III NF-75 In-line Gas Filters
  • Cleanest, most efficient all-metal filters available
  • Patented nickel filter membrane offers superior corrosion resistance and excellent compatibility with inert and reactive gases. (Not recommended for use with CO, O3 and low-level hydride dopant gases.)
  • Ideal for high-temperature and dynamic-pressure applications
  • Typically used for flows up to 75 SLPM
 
Wafergard® III NF-75 In-line Gas Filters
Materials:
 Filter element: Patented, sintered nickel membrane filter.

Housing: Electropolished F20 stainless steel housing

Surface finish interior: <=5 μin Ra

Helium leak rating: Qualified 2`10-10 atm-cc/sec. Tested 1`10-9 atm-cc/sec.
Downstream cleanliness:
 Particles1: Less than 0.03 particles/Liter (<1 particle/ft3) greater than 0.01 μm

Volatiles2: Volatile outgassing of H2O, O2 and THC is below detectable limits (by RGA and FID at room temperature)
Particle retention:
 Greater than 99.9999999% (9 LRV) removal of all particles at maximum rated flow (referenced at the most penetrating particle size)
Removal rating:
 >=0.003 μm
Operating conditions:
 Maximum inlet pressure: 70 bar (1000 PSI) at 100°C

Maximum forward/reverse differential pressure: 10 bar (150 PSID)

Maximum operating temperature: Inert gases 400°C at 35 bar (500 PSI); Corrosive and reactive gases: 50°C at 70 bar (1000 PSI)
Flow rating:
 Refer to performance data
Warranty:
 5 year
Notes:
 1) Particle cleanliness qualified following SEMASPEC Test Method for Particle Shedding (#93021511A-STD)

2) Volatile cleanliness qualified following SEMASPEC Test Methods for: THC Contribution (#90120396B-STD), Moisture Contribution (#90120397B-STD), Oxygen Contribution (#90120398B-STD)
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