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Impact® Asymmetric Disposable Filters

Rapid change-out UPE membrane filters for point-of-use photochemical filtration, including photoresists and solvents. Available in 5 nm and 10 nm retention ratings
Data Sheet (524097)
 
Impact® Asymmetric Disposable Filters
  • Available in 5 nm retention rating - tightest membrane technology to meet critical line-width processes
  • Design optimized for use with the Impact® manifold and IntelliGen® dispense systems; extremely clean for metal ions and extractables
  • Minimal chemical exposure, rapid connection design, allows quick filter installation and minimizes downtime while limiting the handling of hazardous chemicals during the installation and disposal processes, thereby promoting a more healthy workplace
  • Small footprint allows installation of more filters on tools for advanced systems
  • Low hold-up volume minimizes chemical waste
  • New pleating technology: Impact V2 5 nm and 10 nm products incorporate more membrane within the same 0.03 μm and 0.05 μm Impact V2 filters, providing the footprint and benefits of ultra fine retention without a flow or pressure drop penalty
  • Proprietary cleaning technology ensures low metals and organic extractables, eliminating another variable to the customer’s process
 
Impact® Asymmetric Disposable Filters
Materials:
 Membrane: Asymmetric ultra-high molecular-weight polyethylene (UHMWPE)

Supports: (upstream, downstream and mold): High-density polyethylene (HDPE)

O-ring: Kalrez® perfluoroelastomer
Manifold Fittings:
 6.35 mm Flowell® 60 Type

5 mm/3 mm Flowell 60 Type

6 mm/4 mm Flowell 60 Type

4 mm/3 mm Flowell 60 Type

6.35 mm Super Type Pillar®
Maximum operating conditions:
 Maximum inlet pressure: 0.34 MPa (3.4 bar, 50 PSI) @ 25°C (77°F)

Maximum forward/reverse differential pressure: 0.27 MPa (2.7 bar, 40 PSI) @ 25°C (77°F)

Maximum operating temperature: 40°C (104°F)
Membrane area:
 1,300 cm2 (1.4 ft2)
Holdup volume:
 <=55 cc
Compatibility:
 PGMEA, PGME, NMP, ethyl lactate, MMP, and cyclohexanone. Not recommended for use with photochemicals containing aromatic hydrocarbons.
Wettability:
 Spontaneously wets in butyl acetate, PGMEA, PGME, ethyl lactate, MMP, ECA, NMP and other photochemical solvents