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Point-of-Tool (POT) Filtration

Installed on the CMP tool
Data Sheet (127832)
 
  • Unique depth media design balances high particle retetion with greater surface area and increased depth for improved gel holding capacity
  • Self-venting design eliminates dead space and prevents slurry dry out in the filter - prolonging overall lifetime
  • Available in 0.3 to 5.0 µm retention ratings retention ratings to capture large and small defect-causing gels and agglomerates
  • Disposable, Connectology® design enables quick filter changeout and limits chemical exposure to operators
 
Solaris® CL Depth Filters
Materials:
Media: Wrapped melt-blown polypropylene

O-ring: Ethylene-Polypropylene Rubber (EPR)
Operating conditions:
Maximum forward pressure: 50 PSI @ 20°C (68°F)

Chemical Mechanical Planarization (CMP) - specific to Solaris filters

Melt-blown graded density polypropylene filters for silica and alumina CMP slurries. Designed for point-of-dispense applications in semiconductor and data storage applications.

Solaris® SCR Filters
Materials:
Media: Wrapped melt-blown polypropylene

O-ring: Ethylene-Polypropylene Rubber (EPR)
Operating conditions:
Maximum forward pressure: 50 PSI @ 20°C (68°F)

Chemical Mechanical Planarization (CMP) - specific to Solaris filters

Melt-blown graded density polypropylene filters for silica and alumina CMP slurries. Designed for point-of-dispense applications in semiconductor and data storage applications.

Solaris® CM Depth Filters
Materials:
Filter media: Polypropylene depth filter

Shell: Polypropylene
Maximum operating conditions:
Maximum liquid service pressure: 3.5 bar at 20°C (68°F)

Maximum operating temperature: 50°C (122°F)
Fittings:
Flare compatible or Connectology® technology
Solaris® Filtration Manifold
Length (connector to connector):
344.17 mm (13.55”)
Length, mounting plate:
299.7 mm (11.80”)
Width, mounting plate:
82.55 mm (3.25")
Height:
114.8 mm (4.52”)
Connections:
Solaris filtration rapid-connections