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Solaris CL Depth Filters

Point-of-Use (POU) CMP Filter
 
Solaris CL Depth Filters
  • Designed to meet the needs of next-generation point-of-use (POU) slurries
  • Optimized depth media with superior agglomerate and gel holding capability prolongs filter life over traditional depth filters
  • Self-venting in vertical installation ensures optimum flow characteristics
  • All polypropylene construction with melt-blown wrapped depth filtration media
  • Optimized wrapped media provides enhanced balance of retention of retention with filter lifetime
  • Disposable, Connectology® design enables rapid, safer installation
 
Solaris CL Depth Filters
Materials
Media: Wrapped melt-blown polypropylene

O-ring: Ethylene-Polypropylene Rubber (EPR)
Operating conditions
Maximum forward pressure: 50 PSI @ 20°C (68°F)

Chemical Mechanical Planarization (CMP) - specific to Solaris filters

Melt-blown graded density polypropylene filters for silica and alumina CMP slurries.  Designed for point-of-dispense applications in semiconductor and data storage applications.