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ALON™ Coating

Highly fluorine etch-resistant and transparent coatings
Data Sheet (559956)
 
ALON™ Coating
  • Excellent fluorine etch resistance
  • Low particle generation
  • Dense and transparent
  • Oxidation and errosion resistant
  • Ideal for semiconductor and high-temperature applications
 
ALON™ Coating
Substrate:
 Compatibility: Metals, ceramics (viz. quartz alumina, AIN)

Size: Up to 24" x 12"
Structure:
 Microcrystalline
Temperature:
 Deposition: 250˚C (482˚F)

Use: 1200˚C (2192˚F)
Coating thickness:
 Up to 8 μm
Electrical resistivity:
 >10-12 Ω-cm
Purity:
 99.95%
Composition:
 Al = 41%; O = 57%; N = 2%
Hardness:
 1300 DPHN
Elastic modulus:
 190 GPa
Roughness:
 2 nm
Corrosion resistance:
 Excellent etch resistance in fluorine environments

Oxidation resistant up to 1200˚C (2192˚F) in air

Resistant to most acids and alkalis