Close
 
header top curve
Home   >   Products   >   Specialty Materials   >   Specialty Coatings   >   PECVD Coatings   >   Transimax™ Coatings

Products

Select one or more of the following fields in order to begin your search.
  Search by Industry   Applications or process step   Keyword or Product Name      
   and/or   and/or      Search

Special Note: Some product links may direct you to our peripheral websites (devicecare.com, diskcare.com, entegrisfluidhandling.com, entegrisfuelcells.com, entegrislifesciences.com, pvprocesssolutions.com, or wafercare.com)

TranSiMax™ Coating

Transparent hard silicon nitride coating
Data Sheet (41482)
 
TranSiMax™ Coating
  • Suitable for high-temperature oxidation/corrosion protection of ceramic materials
  • Optically transparent
  • Exhibits excellent breakdown voltage
  • Low-temperature vacuum plasma process
  • Coating composition can be tailored to deposit a family of silicon nitride coatings
  • Reduces particles and plasma attack during semiconductor wafer processing
 
TranSiMax™ Coating
Substrate:
 Compatibility: Most metals and ceramics

Size: Up to 91 cm (36”)

Geometry: Any shape, including complex geometries
Structure:
 Amorphous
Temperature:
 Deposition: <150˚C (302˚F)

Use: 1000˚C (1832˚F)
Coating thickness:
 A few nm to over 100 μm
Electrical resistivity:
 ˜1013 Ω-cm
Hardness:
 1200 DPHN
Purity:
 99.95%
Wear resistance:
 Very good
Corrosion resistance:
 High-temperature oxidation resistance in air up to 650˚C (1202˚F)

Excellent aqueous corrosion resistance