Products

Entegris Track/Coater/Developer chemical air filters have been solving Airborne Molecular Contamination (AMC) filtration requirements from OEM’s Tokyo Electron, Sokudo, Sigmameltec and semiconductor photolithography and photomask end-users for over 11 years.
 
All Entegris Track/Coater/Developer filters incorporate a unique filter design that maximizes media utilization and efficiency while minimizing pressure drop. Designed for coater-developer tools, Entegris filters provide unparalleled protection against unplanned elevated contamination events such accidental spills of solvents and developer chemicals.
 
Filter Products
 
VSII-THC media chemical air filters are designed specifically for and approved by Tokyo Electron and incorporate a patent-pending polymer-based filtration media that is completely dopant and outgas free providing superior protection against the full range of total molecular base gas phase contaminants. These high-performance filters have been shown to remove airborne molecular ammonia and organic amine contaminants effectively and to reduce the discharge of amines to the sub-part-per-billion range.
 
VSII-VP (value plus) media chemical air filters are designed to Tokyo Electron specifications and incorporate a patent-pending polymer-based filtration media that is completely dopant and outgas free providing superior protection against the full range of total molecular base gas phase contaminants. These high-performance filters are the second generation VSII-THC filters utilizing design for manufacture and common materials of construction providing an improved cost of ownership and have the same ability to remove airborne molecular ammonia and organic amine contaminants effectively and to reduce the discharge of amines to the sub-part-per-billion range.
 
VSII-AB media chemical air filters are designed to Tokyo Electron specifications and incorporate a patent-pending polymer-based and treated carbon filtration media that is completely dopant and outgas free providing superior protection against the full range of total molecular base and inorganic acid gas phase contaminants. These high-performance filters are the third generation VSII-THC filters utilizing ease to manufacture and common materials of construction providing an improved cost of ownership and have shown to have the same ability to remove airborne amines and inorganic acid contaminants effectively and to reduce the discharge of amines to the sub-part-per-billion range.
 
VSII-CSP hybrid media chemical air filters are designed to Tokyo Electron specifications and incorporate a unique combination of carbon and polymeric chemical media that targets and removes molecular acids such as HCl, H2SO4 and HNO3, acid forming species like SO2, molecular bases such as NH3, NMP and amines, and condensable organic compounds defined as those with boiling points above 150ºC.
 
VSII-Sokudo chemical air filters are designed specifically for and approved by Sokudo (formerly DNS) and incorporate a patent-pending polymer-based filtration media that is completely dopant and outgas free providing superior protection against the full range of total molecular base gas phase contaminants. These high-performance filters have been shown to remove airborne molecular ammonia and organic amine contaminants effectively and to reduce the discharge of amines to the sub-part-per-billion range.
 
VSII-Sigmameltec chemical air filters are designed specifically for and approved by Sigmameltec and incorporate a patent-pending polymer-based filtration media that is completely dopant and outgas free providing superior protection against the full range of total molecular base gas phase contaminants. These high-performance filters have been shown to remove airborne molecular ammonia and organic amine contaminants effectively and to reduce the discharge of amines to the sub-part-per-billion range.