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Track

Filtration solutions to remove acids, amines and condensable organics

Airborne Molecular Contamination (AMC) in the track environment is most commonly a molecular-based amine, such as ammonia. Chemically amplified resists (DUV) are particularly susceptible to these molecular-based contaminants in the fab air. Wafers are potentially exposed to these contaminants from the resist coating to post-exposure bake step. To prevent wafer defects caused from exposure to these contaminants, Entegris provides a portfolio of chemical filters used in the plenum and sub-fab.

 

All Entegris Track/Coater/Developer filters incorporate a unique filter design that maximizes media utilization and efficiency while minimizing pressure drop. Designed for coater-developer tools, Entegris filters provide unparalleled protection against unplanned elevated contamination events such accidental spills of solvents and developer chemicals.
Vaporsorb™ II AB Chemical Track Filter
Superior protection against acid and amine-based contaminants in Tokyo Electron Lithography Tracks
  • Protects against full range of total molecular acid and base gas phase contaminants
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
  • Long service life eliminates tool interruption and lowers cost of ownership
Vaporsorb™ II-ABC Lithography Track Chemical Air Filter
Superior protection against acids, amines and condensable organics in Tokyo Electron (TEL) LIthography Tracks
  • Protects against full range of total molecular gas phase acids, bases and condensable organics
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-snd-develop tracks
  • Long service life eliminates tool interruptions and lowers cost of ownership
Vaporsorb™ II-THC Lithography Track Chemical Air Filter
Superior protection against the full range of total molecular base (TMB), gas phase contaminants
  • Protects against the full range of TMB gas phase contaminants
  • Guaranteed performance (when properly installed in accordance with OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
  • Long service life eliminates tool interruptions and lowers cost of ownership
Vaporsorb™ II VP
Superior protection against amine-based contaminants in Tokyo Electron Lithography Tracks
  • Protects against the full range of TMB gas phase contaminants
  • Guaranteed performance (when properly installed to OEM specifications)
  • Guaranteed configuration fit of filter sizes for all lithography coat-and-develop tracks
  • Long service life eliminates tool interruptions and lowers cost of ownership
E2600 Filter Housing
Advanced protection for optics and resists
  • Hybrid media chemical air filters remove a full range of contaminants including acids, bases and condensable organics
  • Internal HEPA filters ensure particle control
  • Interstack sample ports allow filter performance monitoring, breakthrough-warming and intelligent filter change out planning
  • Small footprint saves cleanroom space
  • Rigid construction ensures reliable, trouble-free operation
  • Chemically clean construction materials ensure contamination-free air to the process tool
  • Dual inlet and outlet transitions for simple, hard or flexible duct connection to process tool air handling systems