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Stepper and Scanner

Filtration solutions to remove acids, amines and condensable organics

Entegris' stepper and scanner filters are designed to provide a variety of contamination protecton from airborne molecular contamination (AMC) sources in a variety of areas and tool makers. 
SilverSet™ Chemical Filters
Advanced scanner optics and resist protection
  • Activated carbon media in inlet filter(s) prevents conversion of PGMEA to acetic acid, which can cause photoresist processing variation and material corrosion
  • Asymetric filter configuration prevents conversion of HDMSO to TMS, which causes scanner lens contamination
  • Hybrid filters containing highly-activated carbon plus advanced plymetric media removes a full range of contaminants including acids, bases and condensable organics
  • 2-year filter lifetime at >99% removal efficiency for acids, bases and condensable organics in typical cleanroom photo bay conditions
  • Pleated filter design in rigid, deep frame optimizes active component surface area for maximum utilization and efficiency
  • Serial filter layout with interstack sampling ports provides multiple levels of protection and allows for filter performance monitoring and early break-through detection
  • Chemical filtration performance validated by Entegris Analytical Services, providing assurance that all filter performance claims are verified with supporting data.
Vaporsorb™ CSP-32 Chemical Air Filters
Advanced optics and resist protection
  • Highly activated carbon plus advanced polymetric media removes acids, bases and condensable organics in each filter cell
  • Pleated filter design in rigid, deep frames optimizes active component surface area for maximum utilization and efficiency
  • Low pressure drop enables serial filter layout and multiple levels of protection
  • Interstack sample ports and seriel filter arrangement allow filter performance monitoring without jeopardizing photoresist or exposed optical surfaces
E2600 Filter Housing
Advanced protection for optics and resists
  • Hybrid media chemical air filters remove a full range of contaminants including acids, bases and condensable organics
  • Internal HEPA filters ensure particle control
  • Interstack sample ports allow filter performance monitoring, breakthrough-warming and intelligent filter change out planning
  • Small footprint saves cleanroom space
  • Rigid construction ensures reliable, trouble-free operation
  • Chemically clean construction materials ensure contamination-free air to the process tool
  • Dual inlet and outlet transitions for simple, hard or flexible duct connection to process tool air handling systems
Scanner Pre-Filter
Extends integrated OEM scanner protection from LMWSi organic compounds
  • Select adsorption chemistry to increase LMWSi and condensable organics efficiency
  • Ideal match to extend existing OEM scanner integral filtration system performance
  • Easy retrofit to any installed scanner system
  • Dedicated team of analytical service experts to support understanding of all filtration system technology and airborne molecular contamination measurement pertaining to filter system interdependancy and life performance
  • Compliance to meet Nikon, ASML and Cannon environment specifications