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Point-of-Dispense Filters

Application Note (1063100)

 

Entegris’ Planarcap® family of CMP slurry filters are designed for point-of-dispense (POD) applications. Developed from the Mykrolis® contamination control technologies, Planarcap filters provide the critical performance balance between the removal of defect-causing agglomerate gels and the delivery of the necessary slurry solution to the wafer surface. Designed for use in copper, STI, ILD and tungsten applications, the wide variety of Planarcap filters capture particles in silica, ceria or alumina slurries.
Planarcap® KPX Point-of-Dispense CMP Filter
Graded-density media pleated design
  • Optimized graded-density depth media pleated design provides the best combination of surface area and media gradient
  • Longer lasting filtration performance
  • Low pressure drop
  • Optimized point-of-dispense and point-of-use CMP filtration solution
Planarcap® LPX Disposable Filters
Point-of-use disposable filters for silica and alumina abrasives for oxide and copper CMP
  • Designed for use with silica and alumina slurry solutions – most typically used in copper, ILD, STI and tungsten CMP applications
  • Available in a wide range of retention ratings from 1 µm to 5 µm
  • Meets the needs of point-of-use CMP slurry filtration applications
  • Available as a disposable filters with Flaretek® fittings
  • All-polypropylene construction with pleated filtration media
Planarcap® TPX Disposable Filters(Product Discontinued) Related Products: Planarcap KPX Point-of-Dispense Filter
Point-of-use disposable filters for ceria and other smaller abrasive particles at low concentrations
  • Pleat design provides customers with superior lifetime and flow
  • Provides a reduction in micro-scratches and total defects
  • Planarcap® TPX Series is specially designed for Ceria and colloidal slurries
  • Optimized to remove defect causing particles while maintaining a low pressure drop and higher lifetime over existing products