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Luminousgard™ and Chacollet™ Gas Purifiers

Removal of AMC inert gases such as CDA and N2
Chacollet Datasheet (120722)
Luminousgard Datasheet (283404)

 

Entegris Luminousgard and Chacollet gas purifiers effectively remove AMC (Airborne Molecular Contamination) in inert gases such as CDA (Compresed Dry Air) and N2 gas. Luminoussgard gas purifiers are designed for removal of hydrocarbons and other organic compunds with C6, or larger, acids and amines. Chacollet gas purifiers were developed for removal of hydrocarbons and other organic compounds with C6 or larger.

 

Using UHP components and preconditioning for purifiers provide excellent initial cleanliness for immediate tool start-up.

 

Applications include purification of purge gas for exposure equipments, DUV laser generators, reticle and wafer inspection tools and other aplications like purge gas for FOUP stocker and loadport.

 
Chacollet™ In-line Hydrocarbon Purifiers
Cost-effective hydrocarbon removal in lithography applications
  • Effectively removes the following impurities in purge gas: CDA, N2, Ar and He
  • Excellent initial cleanliness: Less than 1 ppb of hydrocarbons (>C6)
  • Maintains high retention in the following volatile impurities: Hydrocarbons (>C6)
  • Can be used at ambient temperature, no power or heat required
  • Various models for various flow rate
Luminousgard™ Gas Purifiers
For hydrocarbons, acids and amines removal in lithography applications
  • Effectively removes the following impurities in purge gas: CDA, N2, Ar and He
  • Maintains high retention in the following volatile impurities: Hydrocarbons (>C6); Acids - SO2, SO3, NO2, HCI, HF, Ch3COOH, H2S; Amines - NH3, CH3NH2, (CH3)3N
  • Excellent initial cleanliness: Less than 1 ppb of hydrocarbons (>C6) degassing at 1 SLPM
  • Effectively removes particles in gas stream
  • Can be used without power or heat required
  • Various models for various flow rate