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Enkiro™ Filters

Ultrapure water filtration in semiconductor applications

Developed from the Mykrolis® contamination control technologies, Enkiro™ filters are the latest development in ultrapure water filters for today's most advanced semiconductor applications. Utilizing a surface modified ultra-high molecular weight polyethylene membrane (UPE) that is spontaneously wettable in ultrapure water, Enkiro CF provides exceptional particle retention with a 20 nm pore size rating.

 

Enkiro CF is available separately or as part of Entegris' LiquidLens™ ultrapure water purification system for liquid immersion lithography applications.

 

Enkiro CF Filters
Ultrapure water filter for immersion lithography applications
  • Hydrophilic, surface modified UPE membrane spontaneously wets in water, eliminating prewetting requirements
  • 20 nm retention rating filters provide excellent small particle retention
  • Large membrane area delivers ultrapure water to the point-of-use rapidly and efficiently
  • Available in 10" and 20" cartridge lengths