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Acids and Bases - Aggressive

Durable, high-purity Teflon® membranes

Liquid filtration of aggressive acids and bases. Generally these materials are used in high concentrations and elevated temperatures. They include oxidizing chemistries, outgassing chemistries, sulfuric acid (H2SO4), nitric acid (HNO3), hydrochloric acid (HCL), potassium chloride (KOH), RCA Cleans ("SPM"), SC1, SC2, NH4OH, ammonium hydroxide and phosphoric acid (high temperature). Entegris filters recommended for aggressive acids and bases use PTFE membranes for ultra purity and durability.
Torrento® Ultra-rententive, High-flow Filters
New standard for high-flow nondewetting Teflon® filters
  • Low membrane resistance design allows 20 nm retention with high flow
  • High flow and low flux allows extended filter lifetime
  • Eliminates prewetting and flushing cycles
  • Excellent performance in out-gassing chemistries
  • Recommended for aqueous-based chemicals at ambient temperatures (including H2SO4, H3PO4, HNO3, HCL, NH4F, H2O2, TMAH, NH4OH and ozonated water) and elevated temperature applications (including SPM, SC1, SC2, SPM, nitride etch, metal etch and organic stripers)
  • ATE design incorporates more membrane for ultra-high flow and extended filter lifetime
  • Nondewetting membrane enables rapid filter “changeout” to maximize process uptime
  • Reduced wear and tear of wet bench pumps minimizes maintenance and replacement costs
QuickChange® ATE Filters
Most advanced, best value filtration with the highest flow, especially for viscous chemistries
  • Available in retention ratings of 0.03 µm, 0.05 µm and 0.1 µm
  • 10 and 20" cartridge and Chem-Line® I and II disposable filter designs
  • Highest membrane surface area: 2.2 m² (23.7 ft²) PTFE membrane area - 10", 4.4 m² (47.4 ft²) - 20"
  • Utilizing advanced M-Pleating membrane technology for highest flow potential
Fluorogard® AT Filters
All-Teflon® membrane filter for wet etch and clean applications
  • Ideal for higher temperature applications
  • All-fluoropolymer materials of construction provide a broad range of chemical compatibility
  • Highly retentive hydrophobic PTFE membrane and PFA supports provide superior resistance in strong chemical processing, pulsing, and high pressure applications
Thermogard™ NE Nitride Etch Filters
Increased structural stability for high-termperature and high-viscosity conditions
  • For high-temperature and high-viscosity conditions
  • High-performance membrane rapidly reduces particle counts
  • Unique patented membrane prevents dewetting during installation or chemical dumps/drains and outgassing chemistries
  • Nondewetting membrane technology in a prewet filter designed for nitride etch baths and other high-temperature applications