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Resist Stripper - Aqueous

High and low temperature photoresist and residue remover

Liquid filtration of complex chemistries used for resist stripping and residue removal. These aqueous based materials are often mixtures of amines and aqueous acids or bases. Entegris filters recommended for resist stripping applications are suitable for batch or single-wafer processes and utilize PTFE and UPE membranes for ultra purity and durability.

 

General Guide => 60°C and Above = PTFE membrane
General Guide => 60°C and Below = Hydrophilic UPE membrane
Torrento® Ultra-rententive, High-flow Filters
New standard for high-flow nondewetting Teflon® filters
  • Low membrane resistance design allows 20 nm retention with high flow
  • High flow and low flux allows extended filter lifetime
  • Eliminates prewetting and flushing cycles
  • Excellent performance in out-gassing chemistries
  • Recommended for aqueous-based chemicals at ambient temperatures (including H2SO4, H3PO4, HNO3, HCL, NH4F, H2O2, TMAH, NH4OH and ozonated water) and elevated temperature applications (including SPM, SC1, SC2, SPM, nitride etch, metal etch and organic stripers)
  • ATE design incorporates more membrane for ultra-high flow and extended filter lifetime
  • Nondewetting membrane enables rapid filter “changeout” to maximize process uptime
  • Reduced wear and tear of wet bench pumps minimizes maintenance and replacement costs
  • For Industrial Use Only. Not for use in food, drug, cosmetic or medical devices manufacturing, processing or packaging operations
QuickChange® ATE Filters
Most advanced, best value filtration with the highest flow, especially for viscous chemistries
  • Available in retention ratings of 0.03 µm, 0.05 µm and 0.1 µm
  • 10 and 20" cartridge and Chem-Line® I and II disposable filter designs
  • Highest membrane surface area: 2.2 m² (23.7 ft²) PTFE membrane area - 10", 4.4 m² (47.4 ft²) - 20"
  • Utilizing advanced M-Pleating membrane technology for highest flow potential
Fluorogard® AT Cartridge Filters
Broad chemical compatibility in medium- to high-flow microelectronics process chemical applications in a prewet package
  • Shipped water-wet and require no IPA prewetting procedure
  • Ideal for higher temperature applications
  • All-fluoropolymer materials of construction provide a broad range of chemical compatibility
  • Highly retentive hydrophobic PTFE membrane and PFA supports provide superior resistance in strong chemical processing, pulsing and high pressure applications
Fluorogard® P-RS Pre-filters
Optimized for removal of films, gels and hard particles from photoresist strippers and residue removers
  • PTFE nonwoven filtration media with 40 µm retention rating
  • Ideal for high-temperature applications
  • Fluorogard P-RS pre-filters are used in series with Fluorogard RS-T filters in non-ashing photoresist stripping applications to deliver long-life filtration with exceptional particle retention