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Resist Stripper - Nonaqueous

High and low temperature photoresist and residue remover

Liquid filtration of complex chemistries used for resist stripping and residue removal. Generally these materials are a mixture of solvent and amines used at elevated temperatures. They include solvent based chemistries, including: NMP, Amines, DMSO and other organic solvents. Entegris filters recommended for resist stripping applications are suitable for batch or single-wafer processes and utilize PTFE and UPE membranes for ultra purity and durability.

 

General Guide => 60°C and Above = PTFE membrane
General Guide => 60°C and Below = UPE membrane
Guardian™ DEV Cartridge Filters
Low-cost solution for KOH and TMAH based developer solution and other high pH chemical filtration applications
  • Patented hydrophilic UPE membrane spontaneously wets to enable rapid system startup
  • All polyethylene construction provides excellent chemical compatibility and long lifetime in a cost-effective device
Guardian™ Plus HPM Cartridge Filters
For use in ammonium hydroxide and TMAH, copper plating solutions, low-temperature organic resist strippers (without peroxide) and similar chemistries
  • HPM cartridge filters provide nearly double the membrane area in a standard ATX style disposable filter design
  • High-flow membrane with ultra-large filtration area provides rapid particle removal and microbubble control for faster bath startup and system qualification
Microgard® Plus Cartridge Filter
Hydrophobic UPE filters with superior cleanliness for high-purity chemical and photochemical filtration
  • Low surfactant binding, excellent wettability and superior downstream cleanliness
  • Exceptional retention efficiency
  • Ultra-high membrane area, ideal for high flow with reduced pressure drop
  • Select cartridges available with special cleaning to ensure the lowest levels of organic and metal extractables
  • Ideal for high-purity chemical and photochemical filtration
Intercept® Plus HPM Filters
Highest flow hydrophilic UPE membranes with the greatest particle removal for sub-micron batch baths and single wafer tools
  • Dual-particle capture mechanism - patented hydrophilic membrane structure provides ultra particle removal capabilities
  • High-flow membrane with ultra-large filtration area provides rapid particle removal and microbubble control for faster bath startup and system qualification
  • Excellent small particle retention
  • High membrane area