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SUPERSiC® Silicon Carbide

Entegris’ line of high-purity silicon carbide products is marketed under the SUPERSiC® trade name. SUPERSiC is a unique silicon carbide material created and customized precisely for specific applications.

 

Entegris provides an array of infiltration materials, cleaning options and coatings to create the material specifications that meets precise needs.

 

Entegris’ unique conversion process produces the highest quality silicon carbide products available on the market today. This process starts with graphite material specially designed and manufactured for use as the precursor in the conversion process.

 

Near-net shaped parts are machined in graphite, purified, and subjected to a proprietary conversion process which substitutes pure silicon atoms for carbon atoms. During conversion Entegris has the ability to fuse parts so that they enter the furnace as an assembly of individual pieces and exit as a monolithic unit, with properties indistinguishable from those of a part originally made from one piece. This is done without the use of adhesives or other bonding agents. This conversion bonding process enables the creation of extremely complex, lightweight structures for aerospace optics such as spaceflight worthy, closed-back, off-axis, aspherical mirrors for satellite systems, or high-purity wafer carriers for the semiconductor and photovoltaic industries. These material and process advantages have placed Entegris on the forefront of silicon carbide component development.

 

SUPERSiC
SUPERSiC is the base converted silicon carbide
  • High-temperature and atmospheric processes
  • Harsh process environments
SUPERSiC-3C
SUPERSiC that has been coated with a 75 μm CVD SiC coating, which seals the surface.
  • Ideal for high-temperature deposition and CVD applications.
SUPERSiC-3CX
SUPERSiC that has been coated twice with a 75 μm CVD SiC coating, which seals the surface.
  • Ideal for high-temperature anneal processes
SUPERSiC-Si
SUPERSiC that has been infiltrated with high-purity silicon
  • Ideal for etch systems
SUPERSiC-Si-3C
SUPERSiC that has been infiltrated with silicon and then coated with a 75 μm CVD SiC coating, sealing off the porosity.
  • Ideal for high-temperature vacuum CVD systems
SUPERSiC-Si-8C
SUPERSiC that has been infiltrated with silicon and then coated with a 200 μm CVD SiC coating
  • Ideal for optical and lithography components