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Ultrapure Water Systems

UPW purification for immersion lithography scanner applications
Data Sheet (1368871)

 

LiquidLens™ ultrapure water (UPW) purification system provides high quality UPW to immersion lithography fabs that require precise control of critical UPW parameters: TOC, Silica and particles level, resistivity, dissolved gases, temperature and pressure.

 

Why "fab" UPW is not good enough for immersion lithography?

  • Fab UPW quality may vary depending on chemicals that are used for purification. Water quality changes over time depending on seasonal and geographical factors.
  • Water temperature, pressure and consistency may change as it moves along the facilities.
  • Entegris UPW purification line includes four products to choose from based on the fab water quality and process requirements

LiquidLens UPW purification system provides high quality ultrapure water to immersion lithography scanner. It ensures fluid lens cleanliness and stability and prevents process interruptions.

 

UPW System Selection Guide


Features
LLG4
LLD2
LLT2		Heat
Exchange
TOC ReductionYes   
Metal RemovalYes   
Silica RemovalOptional   
DegassingYesYes  
Temperature ControlYesYesYesYes
FiltrationYesYesYes 
Pressure ControlYesYesYes 
Data LoggingYesYesYes 

 

 

 

For more information about Liquid systems please contact your Regional Representative.

 
LiquidLens™ LLG4 UPW Purification System
UPW purification for immersion lithography scanners’ fluid lens
  • The LiquidLens system provides stability and purity of fluid lens by reducing TOC, anion/ions, silica, particles level and dissolved gas
  • Maintains stable refractive index, low optical absorbance and minimize resist interaction to ensure optimum optical properties
  • Protects against process upsets, caused by seasonal/geographic changes
  • Provides real-time monitoring of critical parameters on tool and on customers central monitoring system.
LiquidLens™ LLD2 UPW Degassing System
UPW degassing for immersion lithography scanners
  • The LiquidLens LLD2 system provides stability and purity of fluid lens by reducing dissolved gas and monitoring the UPW quality
  • Continuously maintains targeted temperature and pressure level of the outlet UPW stream
  • Ensures process and machine safely with safety alarms and leak sensors
  • Provides real-time monitoring of critical parameters on tool and on customers central monitoring system.
LiquidLens™ LLT2 UPW Temperature Control System
UPW temperature stabilization for immersion lithography scanners
  • Provides stability of the Immersion scanners fluid lens by maintaining a targeted temperature of the UPW outlet stream
  • Ensures process and machine safely with safety alarms and leak sensors
  • Provides real-time monitoring of critical parameters on tool and on customers central monitoring system